Mr. Pierre Leveque Profile

Pierre Leveque

at STMicroelectronics SA

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 27 April 2023 Poster + Paper

Optimizations of APC multivariate algorithm for linear mix and match overlay control

Benjamin Duclaux, Maxime Gatefait, Alice Pelletier, Laurent Lecarpentier, Pierre Leveque, Cédric Monget

Proceedings Volume 12496, 1249627 (2023) https://doi.org/10.1117/12.2655762

KEYWORDS: Scanners, Advanced process control, Mathematical optimization, Overlay metrology, Feedback loops, Process modeling, Lithography

Read Abstract +

Run to Run systems for lithography are taking a critical place in the process control ecosystem ^[1] as the industry is pushing towards advanced nodes and tight specifications. As multivariate algorithms with context decomposition provide reactivity, adaptability, and monitoring efficiency, they can be limited by the feedbacks declared in the R2R model. Especially in lithography overlay where various machines can have different behaviors depending on layers and reticles. Adding to this complexity, the specificity for overlay is that it is always measured to a reference, that measure can be impacted by the reference process conditions and signatures can also propagate through the layers. In case of events on reference machines it is essential to be able to apply different process corrections depending on various lot history. Different process conditions were also found to be required for different products depending on tool couples (process/reference) to meet mix and match performance requirements. In such a configuration, classical feedback effects composing the multivariate R2R loops also need to evolve in concatenated effects, to be able to model coupling components not modeled until then. This work has been done at ST, in a high mix logic fab where many different technologies coexist on the same tooling, increasing complexity for APC control.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years