Mr. Raghuveer Patlolla Profile

Raghuveer Patlolla

at IBM Thomas J. Watson Research Ctr.

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Publications (2)

Proceedings Article | 28 March 2017 Paper

An OCD perspective of line edge and line width roughness metrology

Ravi Bonam, Raja Muthinti, Mary Breton, Chi-Chun Liu, Stuart Sieg, Indira Seshadri, Nicole Saulnier, Jeffrey Shearer, Raghuveer Patlolla, Huai Huang

Proceedings Volume 10145, 1014511 (2017) https://doi.org/10.1117/12.2258196

KEYWORDS: Line width roughness, Metrology, Edge roughness, Optical metrology, Process control, Line edge roughness, Semiconductors, Modeling, Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, Photomasks, 3D modeling, Extreme ultraviolet, Modulation

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Proceedings Article | 24 March 2017 Paper

Comprehensive analysis of line-edge and line-width roughness for EUV lithography

Ravi Bonam, Chi-Chun Liu, Mary Breton, Stuart Sieg, Indira Seshadri, Nicole Saulnier, Jeffrey Shearer, Raja Muthinti, Raghuveer Patlolla, Huai Huang

Proceedings Volume 10143, 101431A (2017) https://doi.org/10.1117/12.2258194

KEYWORDS: Line width roughness, Edge roughness, Lithography, Extreme ultraviolet lithography, Line edge roughness, Metrology, Photomasks, Semiconducting wafers, Semiconductors, Optical imaging, Photoresist processing, Etching, Extreme ultraviolet, Modulation

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