Raoul Kirner
at Focuslight Switzerland SA
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 30 August 2019 Presentation + Paper
Proceedings Volume 11103, 111030A (2019) https://doi.org/10.1117/12.2529195
KEYWORDS: Microlens, Picture Archiving and Communication System, Microlens array, Wafer-level optics, Manufacturing, Optics manufacturing, Tolerancing, Reactive ion etching, Semiconducting wafers

Proceedings Article | 26 March 2019 Paper
Proceedings Volume 10958, 109581D (2019) https://doi.org/10.1117/12.2514964
KEYWORDS: Spatial coherence, Lithographic illumination, Light emitting diodes, Lithography, Reflectors

Proceedings Article | 14 September 2018 Paper
Johana Bernasconi, Toralf Scharf, Marcel Groccia, Raoul Kirner, Wilfried Noell, Hans Peter Herzig
Proceedings Volume 10758, 107580A (2018) https://doi.org/10.1117/12.2319288
KEYWORDS: Light emitting diodes, Lamps, Mercury, Reflectors, Lithographic illumination, Photomasks, Lithography, Printing, Prototyping

Proceedings Article | 20 March 2018 Paper
Proceedings Volume 10587, 105871F (2018) https://doi.org/10.1117/12.2297171
KEYWORDS: Lithography, Diffusers, Diffractive optical elements, Lithographic illumination, Continuous wave operation, Semiconductor lasers, 193nm lithography, Beam shaping, Microlens array, Light sources and illumination

Proceedings Article | 20 March 2018 Paper
Proceedings Volume 10587, 105870W (2018) https://doi.org/10.1117/12.2296503
KEYWORDS: Photomasks, Lithography, Lithographic illumination, Semiconducting wafers, Light sources, Semiconductor lasers, Beam shaping, Continuous wave operation, Crystals, Diffusers

Proceedings Article | 15 February 2018 Paper
D. Opalevs, M. Scholz, J. Stuhler, C. Gilfert, L. J. Liu, X. Y. Wang, A. Vetter, R. Kirner, T. Scharf, W. Noell, C. Rockstuhl, R. K. Li, C. T. Chen, R. Voelkel, P. Leisching
Proceedings Volume 10511, 105112C (2018) https://doi.org/10.1117/12.2290288
KEYWORDS: Laser systems engineering, Crystals, Deep ultraviolet, Lithography, Semiconductor lasers, Laser applications, Continuous wave operation, Nonlinear crystals, Photomasks, Laser crystals

Proceedings Article | 27 September 2016 Presentation + Paper
Raoul Kirner, Kevin Mueller, Pauline Malaurie, Uwe Vogler, Wilfried Noell, Toralf Scharf, Reinhard Voelkel
Proceedings Volume 9951, 99510A (2016) https://doi.org/10.1117/12.2237339
KEYWORDS: Imaging systems, Imaging arrays, Microlens array, Lithography, Microlens, Semiconducting wafers, Photomasks, Superposition, Point spread functions, Multichannel imaging systems

Proceedings Article | 13 May 2013 Paper
Matthias Hillenbrand, Adrian Grewe, Mohamed Bichra, Roman Kleindienst, Lucia Lorenz, Raoul Kirner, Robert Weiß, Stefan Sinzinger
Proceedings Volume 8788, 87880V (2013) https://doi.org/10.1117/12.2020334
KEYWORDS: Sensors, Confocal microscopy, Colorimetry, Detector arrays, Multiplexing, Imaging systems, Spectroscopy, Light sources, Prisms, RGB color model

Proceedings Article | 5 March 2013 Paper
L. A. Dunbar, G. Bergonzi, U. Vogler, S. Angeloni, R. Kirner, A. Bramati, B. Timotijevic , R. Voelkel, R. Stanley
Proceedings Volume 8613, 86131D (2013) https://doi.org/10.1117/12.2003043
KEYWORDS: Photomasks, Lithography, Lithographic illumination, Optical lithography, Semiconducting wafers, Micro optics, Molybdenum, Wafer-level optics, Neodymium, Submicron lithography

Proceedings Article | 18 December 2012 Paper
M. Hillenbrand, A. Grewe, M. Bichra, B. Mitschunas, R. Kirner, R. Weiß, S. Sinzinger
Proceedings Volume 8550, 85500D (2012) https://doi.org/10.1117/12.981147
KEYWORDS: Colorimetry, Confocal microscopy, Imaging systems, Sensors, Chromatic aberrations, Hyperspectral imaging, Monochromatic aberrations, Spectral resolution, Point spread functions, Sensing systems

Proceedings Article | 5 May 2012 Paper
Proceedings Volume 8429, 84290X (2012) https://doi.org/10.1117/12.922493
KEYWORDS: Diffusers, Speckle, Glasses, Refractive index, Metrology, Cameras, Statistical analysis, Speckle pattern, Light scattering, Free space

Showing 5 of 11 publications
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