Mr. Ryuichi Saito Profile

Ryuichi Saito

at Toshiba Corp

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Publications (1)

Proceedings Article | 28 March 2017 Presentation + Paper

Wide-range directed self-assembly lithography enabling wider range of applicable pattern size for both hexagonal multi-hole and line/space

Seiji Morita, Ryuichi Saito, Ryosuke Yamamoto, Norikatsu Sasao, Tomoaki Sawabe, Koji Asakawa, Shinobu Sugimura

Proceedings Volume 10144, 101440R (2017) https://doi.org/10.1117/12.2257987

KEYWORDS: Lithography, Dry etching, Immersion lithography, Annealing, Resistance, Double patterning technology, Molecular self-assembly, Optical lithography, Scanning electron microscopy, Organic materials, Directed self assembly, Semiconducting wafers, Reactive ion etching, Metals

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