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Saroja Ramamurthi
Applications Manager at KLA Texas
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Publications (1)
Proceedings Article | 2 April 2014 Paper
In-line focus monitoring and fast determination of best focus using scatterometry
Steven Thanh Ha, Benjamin Eynon, Melany Wynia, Jeff Schmidt, Christian Sparka, Antonio Mani, Roie Volkovich, SeungHoon Yoon, David Tien, John Robinson, Saroja Ramamurthi
Proceedings Volume 9050, 90502Y (2014) https://doi.org/10.1117/12.2047576
KEYWORDS: Semiconducting wafers, Scanners, Scatterometry, Optical design, Scatter measurement, Finite element methods, Metrology, Semiconductors, Matrices, Lithography
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