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Stefan Alexandrescu
at DuPont Electronics & Industrial
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Publications (4)
Proceedings Article | 10 April 2024 Presentation + Paper
Advanced EUV CAR small molecule compounds design and its impact to etch performance
Yinjie Cen, Jong Keun Park, Suzanne Coley, Benjamin Naab-Rafael, Li Cui, Emad Aqad, Stefan Alexandrescu, Rochelle Rena, Sylvie Eckert, Jason Behnke, ChoongBong Lee, Karen Petrillo
Proceedings Volume 12957, 129570A (2024) https://doi.org/10.1117/12.3010931
KEYWORDS: Etching, Photoresist materials, Extreme ultraviolet lithography
Proceedings Article | 10 April 2024 Poster
Formulation and filtration strategies to reduce etch related defectivity of advanced chemically amplified EUV resist
Suzanne Coley, Jong Keun Park, Emad Aqad, Yinjie Cen, Li Cui, Conner Hoelzel, Benjamin Naab, Maria Melanson, Hung Tran, Stefan Alexandrescu, Rochelle Rena, Jason Behnke, Karen Petrillo
Proceedings Volume 12957, 129571Y (2024) https://doi.org/10.1117/12.3010919
KEYWORDS: Extreme ultraviolet, Stochastic processes, Etching, Photoresist processing, Photons, Manufacturing, Lithography, Design and modelling, Optical lithography, Materials processing
Proceedings Article | 9 April 2024 Poster + Paper
Identifying trends in photoresist polymer properties to improve line and space defects
Benjamin Rafael-Naab, Jong Keun Park, Emad Aqad, Yinjie Cen, Suzanne Coley, Li Cui, Conner Hoelzel, Choong Bong Lee, Jason Behnke, Rochelle Rena, Sylvie Eckert, Stefan Alexandrescu, K. A. Niradha Sachinthani, Michael Finch, Karen Petrillo, Li Cheng
Proceedings Volume 12957, 129571S (2024) https://doi.org/10.1117/12.3010493
KEYWORDS: Defect inspection, Photoresist materials, Polymers, Line width roughness, Extreme ultraviolet lithography, Photoacid generators, Semiconducting wafers
Proceedings Article | 1 May 2023 Poster + Paper
Considerations in the design of photoacid generators
Conner Hoelzel, Li Cui, Benjamin Naab, Jong Park, Philjae Kang, Kenneth Hernandez, Suzanne Coley, Stefan Alexandrescu, Rochelle Rena, James Cameron, Emad Aqad
Proceedings Volume 12498, 124981V (2023) https://doi.org/10.1117/12.2658981
KEYWORDS: Photoacid generators, Extreme ultraviolet lithography, Electrons, Extreme ultraviolet, Polymers, Design and modelling, Lithography, Materials properties, Line width roughness, Semiconducting wafers
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