Mr. Toshiro Nakano Profile

Toshiro Nakano

at NICHIAS Corp

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Author

Publications (3)

Proceedings Article | 26 March 2008 Paper

Molecular contamination control technologies for high volume production in high NA 193-nm lithography (phase II)

Toshiro Nakano, Takashi Tanahashi, Akihiro Imai, Kazuki Yamana, Tainen Shimotsu

Proceedings Volume 6923, 692338 (2008) https://doi.org/10.1117/12.771905

KEYWORDS: Adsorption, Gases, Ion exchange, Carbon, Chemical analysis, Diffusion, Contamination control, Lithography, Semiconducting wafers, Photoresist processing

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Proceedings Article | 21 March 2007 Paper

Molecular contamination control technologies for high-volume production phase in high-NA 193-nm lithography

Toshiro Nakano, Takashi Tanahashi, Akihiro Imai, Kazuki Yamana, Tainen Shimotsu, Nobuhiro Takahashi, Masaharu Shioguchi, Yoshitaka Matsuda, Junichi Kitano

Proceedings Volume 6519, 65193I (2007) https://doi.org/10.1117/12.710211

KEYWORDS: Adsorption, Ion exchange, Carbon, Dielectrophoresis, Gases, Ions, Lithography, Semiconductors, Semiconductor manufacturing, 193nm lithography

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Proceedings Article | 29 March 2006 Paper

Molecular contamination control technologies for high NA 193nm lithography

Akihiro Imai, Takashi Tanahashi, Kazuki Yamana, Toshiro Nakano, Nobuhiro Takahashi, Masaharu Shioguchi, Junichi Kitano

Proceedings Volume 6153, 615332 (2006) https://doi.org/10.1117/12.656871

KEYWORDS: Adsorption, Carbon, Photoresist processing, Contamination control, Semiconductors, 193nm lithography, Semiconductor manufacturing, Polymers, Manufacturing, Semiconducting wafers

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