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Tsuyoshi Chiba
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 9 September 2019 Paper
Development of color 8K photo printing with plasmonic pixels
Y. Ueba, T. Takanokura, T. Chiba, M. Kitamura, M. Yamamoto, J. Takahara
Proceedings Volume 11082, 110821V (2019) https://doi.org/10.1117/12.2527883
KEYWORDS: Photography, Metals, Plasmonics, Printing, Visualization, Image resolution, Image processing, Holograms
Proceedings Article | 30 September 2009 Paper
6-inch circle template fabrication for patterned media using a conventional resist and new chemically amplified resists
Proceedings Volume 7488, 74881S (2009) https://doi.org/10.1117/12.833449
KEYWORDS: Silicon, Quartz, Photoresist processing, Nanoimprint lithography, Chemically amplified resists, Etching, Ultraviolet radiation, Photomasks, Thin films, Beam propagation method
Proceedings Article | 11 May 2009 Paper
Developing quartz wafer mold manufacturing process for patterned media
Proceedings Volume 7379, 73792Q (2009) https://doi.org/10.1117/12.824340
KEYWORDS: Quartz, Semiconducting wafers, Manufacturing, Etching, Nanoimprint lithography, Beam propagation method, Reactive ion etching, Semiconductors, Printing, Metrology
Proceedings Article | 11 May 2009 Paper
Si-mold fabrication for patterned media using high-resolution chemically amplified resist
Proceedings Volume 7379, 73790L (2009) https://doi.org/10.1117/12.824262
KEYWORDS: Silicon, Nanoimprint lithography, Adhesives, Chemically amplified resists, Electron beam lithography, Head-mounted displays, Line edge roughness, Scanning electron microscopy, Ultraviolet radiation, Photoresist processing
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