Mr. Wythe Lin Profile

Wythe Lin

at ASML Taiwan Ltd

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Author

Publications (2)

Proceedings Article | 12 December 2009 Paper

Overlay improvement by ASML HOWA 5th alignment strategy

Raf Wang, CY Chiang, Wilson Hsu, Richer Yang, Todd Shih, Jackie Chen, Jonathan Chiu, Wythe Lin

Proceedings Volume 7520, 752023 (2009) https://doi.org/10.1117/12.839816

KEYWORDS: Semiconducting wafers, Optical alignment, Distortion, Overlay metrology, Front end of line, Lithography, Scanners, Capacitance, Current controlled current source, Yield improvement

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Proceedings Article | 4 December 2008 Paper

Throughput improvement from routing reduction by using CPE (correction per exposure)

Ray Chang, Jui-Chin Yang, Chia-Hung Chen, Chi-Chun Lin, Cathy Wang, Wythe Lin, Chia-Chi Chen

Proceedings Volume 7140, 714043 (2008) https://doi.org/10.1117/12.806643

KEYWORDS: Semiconducting wafers, Scanners, Etching, Overlay metrology, Optical alignment, Yield improvement, Lithography, Current controlled current source, Samarium, Time metrology

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