The thermal accumulation effect is an important phenomenon for ultrafast laser material processing and was believed to happen only at high repetition rates over MHz. This study discovers that thermal accumulation can occur at low repetition rates in the kHz range in certain materials. It is found the threshold repetition rates required to initiate thermal accumulation are intrinsically determined by the thermal properties of the material and insensitive to ambient conditions. A simple analytical method is developed to predict the thermal accumulation threshold repetition rate, and the prediction agrees well with the experimental results.
Conference Committee Involvement (2)
Laser-based Micro- and Nanoprocessing XIX
25 January 2025 | San Francisco, California, United States
Laser-based Micro- and Nanoprocessing XVIII
29 January 2024 | San Francisco, California, United States
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.