Dr. Younjin Cho Profile

Dr. Younjin Cho

at Samsung SDI Co Ltd

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Author

Publications (5)

Proceedings Article | 27 March 2014 Paper

Decreasing curing temperature of spin-on dielectrics by using additives

Jin Hee Bae, Kwen Woo Han, Eun Su Park, Hui Chan Yoon, Yoong Hee Na, Jin Woo Seo, Wan Hee Lim, Bo Sun Kim, Jun Young Jang, Younjin Cho

Proceedings Volume 9051, 90511R (2014) https://doi.org/10.1117/12.2046098

KEYWORDS: Dielectrics, Silicon, Silica, Oxides, Semiconductors, Etching, Resistance, Manufacturing, Polymers, Plasma

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Proceedings Article | 16 April 2011 Paper

Photobase generator enabled pitch division: a progress report

Xinyu Gu, Younjin Cho, Takanori Kawakami, Yuji Hagiwara, Brandon Rawlings, Ryan Mesch, Toshiyuki Ogata, Taeho Kim, Takehiro Seshimo, Wade Wang, Arun Sundaresan, Nicholas Turro, Roel Gronheid, James Blackwell, Robert Bristol, C. Grant Willson

Proceedings Volume 7972, 79720F (2011) https://doi.org/10.1117/12.879861

KEYWORDS: Line edge roughness, Polymers, Lithography, Diffusion, Optical lithography, Photomasks, Chemical analysis, Scanning electron microscopy, Absorbance, Chemistry

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Proceedings Article | 16 April 2011 Paper

Polymer-bound photobase generators and photoacid generators for pitch division lithography

Younjin Cho, Xinyu Gu, Yuji Hagiwara, Takanori Kawakami, Toshiyuki Ogata, Brandon Rawlings, Yongjun Li, Arun Sundaresan, Nicholas Turro, Robert Bristol, James Blackwell, C. Grant Willson

Proceedings Volume 7972, 797221 (2011) https://doi.org/10.1117/12.879771

KEYWORDS: Polymers, Lithography, Line edge roughness, NOx, Analog electronics, Photomasks, Polymerization, Chlorine, Molecules, Ultraviolet radiation

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Proceedings Article | 26 March 2010 Paper

Photobase generator assisted pitch division

Xinyu Gu, Christopher Bates, Younjin Cho, Takanori Kawakami, Tomoki Nagai, Toshiyuki Ogata, Arunkumar Sundaresan, Nicholas Turro, Robert Bristol, Paul Zimmerman, C. Grant Willson

Proceedings Volume 7639, 763906 (2010) https://doi.org/10.1117/12.846395

KEYWORDS: Lithography, Photomasks, Critical dimension metrology, Photoresist materials, Manufacturing, Polymers, Semiconductors, Double patterning technology, Image processing, Interferometry

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Proceedings Article | 1 April 2009 Paper

Fundamental study of optical threshold layer approach towards double exposure lithography

Xinyu Gu, Adam Berro, Younjin Cho, Kane Jen, Saul Lee, Tomoki Ngai, Toshiyuki Ogata, William Durand, Arunkumar Sundaresan, Jeffrey Lancaster, Steffen Jockusch, Paul Zimmerman, Nicholas Turro, C. Willson

Proceedings Volume 7273, 72731C (2009) https://doi.org/10.1117/12.814298

KEYWORDS: Polymers, Lithography, Crystals, Diffusion, Temperature metrology, Extreme ultraviolet lithography, Sensors, Polymer thin films, Optical lithography, Photomasks

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