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Yuta Kuroki
at Osaka Institute of Technology
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Publications (1)
Proceedings Article | 22 September 2014 Paper
Scanning removal of ion-implanted novolak resist by using a laser irradiation
Tomosumi Kamimura, Yuta Kuroki, Takuya Kiriyama, Hiroki Muraoka, Takashi Nishiyama, Yoshiyuki Harada, Hiroyuki Kuramae, Hideo Horibe
Proceedings Volume 9238, 92380J (2014) https://doi.org/10.1117/12.2073477
KEYWORDS: Silicon, Semiconducting wafers, Laser irradiation, Ions, Laser induced damage, Wafer-level optics, Pulsed laser operation, Absorbance, Laser damage threshold, Absorption
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