Parkson W. Chen
at Taiwan Mask Corp
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 28 May 2003 Paper
Rik Jonckheere, Vicky Philipsen, Gerd Scheuring, Frank Hillmann, Hans-Jurgen Brueck, Volodymyr Ordynskyy, Kai Peter, Andrew Hourd, Thomas Schaetz, Shiuh-Bin Chen, Parkson Chen, Karl Sommer
Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515116
KEYWORDS: Scanning electron microscopy, Photomasks, Pellicles, Reticles, Calibration, Semiconducting wafers, Critical dimension metrology, Binary data, 193nm lithography, Metrology

Proceedings Article | 28 May 2003 Paper
Gerd Scheuring, Alexander Petrashenko, Stefan Doebereiner, Frank Hillmann, Hans-Jurgen Bruck, Andrew Hourd, Anthony Grimshaw, Gordon Hughes, Shiuh-Bin Chen, Parkson Chen, Thomas Schatz, Thomas Struck, Paul van Adrichem, Herman Boerland, Sigrid Lehnigk
Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515107
KEYWORDS: Photomasks, Critical dimension metrology, Reticles, Inspection, Deep ultraviolet, Metrology, Binary data, Objectives, Environmental sensing, Cameras

Proceedings Article | 28 May 2003 Paper
Andrew Hourd, Anthony Grimshaw, Gerd Scheuring, Christian Gittinger, Stefan Dobereiner, Frank Hillmann, Hans-Jurgen Bruck, Hans Hartmann, Volodymyr Ordynskyy, Kai Peter, Shiuh-Bin Chen, Parkson Chen, Rik Jonckheere, Vicky Philipsen, Thomas Schatz, Karl Sommer
Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515114
KEYWORDS: Lamps, Reticles, Critical dimension metrology, Metrology, Contamination, Deep ultraviolet, Photomasks, Reliability, Time metrology, Manufacturing

Proceedings Article | 27 December 2002 Paper
Andrew Hourd, Anthony Grimshaw, Gerd Scheuring, Christian Gittinger, Stefan Doebereiner, Frank Hillmann, Hans-Juergen Brueck, Shiuh-Bin Chen, Parkson Chen, Rik Jonckheere, Vicky Philipsen, Hans Hartmann, Volodymyr Ordynskyy, Kai Peter, Thomas Schaetz, Karl Sommer
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468090
KEYWORDS: Reticles, Metrology, Deep ultraviolet, Photomasks, Critical dimension metrology, Line edge roughness, Binary data, Manufacturing, Computed tomography, Image processing

Proceedings Article | 16 August 2002 Paper
Andrew Hourd, Anthony Grimshaw, Gerd Scheuring, Christian Gittinger, Hans-Juergen Brueck, Shiuh-Bin Chen, Parkson Chen, Hans Hartmann, Volodymyr Ordynskyy, Rik Jonckheere, Vicky Philipsen, Thomas Schaetz, Karl Sommer
Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479349
KEYWORDS: Photomasks, Critical dimension metrology, Deep ultraviolet, Reticles, Metrology, Semiconductors, Optics manufacturing, Reliability, Optical imaging, Manufacturing

Proceedings Article | 18 December 1998 Paper
Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332825
KEYWORDS: Mask making, Photomasks, Optical proximity correction, Photomask technology, Ear, Etching, Manufacturing, Ions, Silicon

Proceedings Article | 1 January 1992 Paper
Proceedings Volume 1604, (1992) https://doi.org/10.1117/12.56941
KEYWORDS: Inspection, Photomasks, Reticles, Databases, Data centers, Ions, Defect inspection, Defect detection, Computing systems, Computed tomography

Showing 5 of 7 publications
Proceedings Volume Editor (1)

Conference Committee Involvement (4)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
Photomask and NGL Mask Technology X
16 April 2003 | Yokohama, Japan
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