Fabrication of membrane mask for next-generation lithography

Dong-Wan Kim; Jared D. Lera; Hanku Cho; Joo-Tae Moon

doi:10.1117/12.373320

30 December 1999 Fabrication of membrane mask for next-generation lithography

Dong-Wan Kim, Jared D. Lera, Hanku Cho, Joo-Tae Moon

Proceedings Volume 3873, 19th Annual Symposium on Photomask Technology; (1999) https://doi.org/10.1117/12.373320
Event: Photomask Technology and Management, 1999, Monterey, CA, United States

Abstract

Membrane masks are commonly adopted for the next generation lithography (NGL) such as proximity X-ray lithography (XRL), ion beam projection lithography (IPL), and SCALPEL. Since the NGL membrane masks have lower mechanical stability than the conventional optical mask, it is necessary to study the distortions of membrane masks during mask fabrication and application. Using various kinds of test patterns such as line and space patterns, contact hole arrays, rectangular island arrays, and square island arrays, the mechanical stiffness changes due to pattern transfer were investigated. The in- plane distortions of the membrane mask due to pattern transfer during mask fabrication are dependent on not only void fraction but also pattern shapes. The membrane masks with various kinds of patterns were fabricated and the in-plane distortions were measured.

Citation Download Citation

Dong-Wan Kim, Jared D. Lera, Hanku Cho, and Joo-Tae Moon "Fabrication of membrane mask for next-generation lithography", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); https://doi.org/10.1117/12.373320

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