Dr. Byoung-Ho Lee
Fellow at Hitachi High-Tech Corporation
SPIE Involvement:
Conference Program Committee | Author
Publications (23)

Proceedings Article | 22 February 2021 Poster + Presentation + Paper
Jong-Hyun Seo, Changhwan Lee, Byoungho Lee, Ayumi Doi, Aoi Yamauchi, Daisuke Bizen, Makoto Suzuki
Proceedings Volume 11611, 116112Q (2021) https://doi.org/10.1117/12.2583623

Proceedings Article | 24 March 2016 Paper
Jeffrey Mileham, Yasushi Tanaka, Doug Anberg, David Owen, Byoung-Ho Lee, Eric Bouche
Proceedings Volume 9778, 97782W (2016) https://doi.org/10.1117/12.2220531
KEYWORDS: Overlay metrology, Lithography, Process control, Interferometry, Optical lithography, Semiconductors, Distortion, High volume manufacturing, Semiconducting wafers, Data modeling, Scanners

Proceedings Article | 8 March 2016 Paper
Proceedings Volume 9778, 977831 (2016) https://doi.org/10.1117/12.2220479
KEYWORDS: Interferometry, Semiconducting wafers, Process control, Semiconductors, Image processing, Control systems, Manufacturing, Defect inspection, Inspection, Overlay metrology, Scanners, Interferometers

Proceedings Article | 10 April 2013 Paper
Jeongho Ahn, Byoungho Lee, Dong-Ryul Lee, Shijin Seong, Hyungseop Kim, Seongchae Choi, Heewon Sunwoo, Junbum Lee, Dongchul Ihm, Soobok Chin, Ho-Kyu Kang
Proceedings Volume 8681, 86811E (2013) https://doi.org/10.1117/12.2011387
KEYWORDS: Inspection, Finite-difference time-domain method, Semiconducting wafers, Defect inspection, Reflectivity, Numerical analysis, Wafer inspection, Thin films, Polarization, Multilayers

Proceedings Article | 5 April 2012 Paper
Byoung Ho Lee, Jeongho Ahn, Dongchul Ihm, Soobok Chin, Dong-Ryul Lee, Seongchae Choi, Junbum Lee, Ho-Kyu Kang, Gangadharan Sivaraman, Tetsuya Yamamoto, Rahul Lakhawat, Ravikumar Sanapala, Chang Ho Lee, Arun Lobo
Proceedings Volume 8324, 832429 (2012) https://doi.org/10.1117/12.916505
KEYWORDS: Inspection, Scanning electron microscopy, Semiconducting wafers, Bridges, Front end of line, Defect detection, Wafer inspection, Defect inspection, Optical inspection, Particles

Showing 5 of 23 publications
Conference Committee Involvement (19)
Metrology, Inspection, and Process Control XXXIX
23 February 2025 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVIII
26 February 2024 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVII
27 February 2023 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVI
25 April 2022 | San Jose, California, United States
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
22 February 2021 | Online Only, California, United States
Showing 5 of 19 Conference Committees
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