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Dr. Tong Zhang
Sr. Member Technical Staff
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Publications (1)
Proceedings Article | 23 March 2006 Paper
Vapor deposited release layers for nanoimprint lithography
Tong Zhang, Boris Kobrin, Mike Wanebo, Romek Nowak, Richard Yi, Jeff Chinn, Markus Bender, Andreas Fuchs, Martin Otto
Proceedings Volume 6151, 615117 (2006) https://doi.org/10.1117/12.654658
KEYWORDS: Nanoimprint lithography, Liquids, Lithography, Coating, Deposition processes, Silicon, Self-assembled monolayers, Photoresist processing, Process control, Plasma
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