Yunqiang Zhang
Engineer at Synopsys Inc
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume 12954, 1295413 (2024) https://doi.org/10.1117/12.3014637
KEYWORDS: Photomasks, Deep ultraviolet, Optical proximity correction, Extreme ultraviolet lithography, Ecosystems, Lithography, Extreme ultraviolet, Yield improvement, Source mask optimization, Printing

SPIE Journal Paper | 20 December 2023
JM3, Vol. 22, Issue 04, 041606, (December 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041606
KEYWORDS: Optical proximity correction, Extreme ultraviolet lithography, Lithography, Optical lithography, Machine learning, Extreme ultraviolet, Semiconducting wafers, Education and training, Industry, Source mask optimization

Proceedings Article | 22 November 2023 Presentation
Linghui Wu, John Valadez, Jian Rao, Jim Burdorf, Yunqiang Zhang, Yongdong Wang, Alex Zepka, Folarin Latinwo
Proceedings Volume PC12751, PC1275109 (2023) https://doi.org/10.1117/12.2687654
KEYWORDS: Error control coding, Performance modeling, Resolution enhancement technologies, Printing, Optical proximity correction, Model-based design, Manufacturing, Extreme ultraviolet, Convection

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12751, 127510T (2023) https://doi.org/10.1117/12.2686921
KEYWORDS: Optical proximity correction, Extreme ultraviolet

Proceedings Article | 25 May 2022 Presentation + Paper
Proceedings Volume 12054, 1205407 (2022) https://doi.org/10.1117/12.2618392
KEYWORDS: Photomasks, Optical proximity correction, Optical lithography, Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Machine learning, Semiconducting wafers, Manufacturing, Deep ultraviolet

Showing 5 of 19 publications
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