A hybrid optimization model of physical optics and geometric optics is implemented for optimizing the imaging brightness uniformity by changing the profile depth distribution of a grating-based exit pupil expander (EPE). A specially modified reactive ion-beam etching system capable of modulating the etching depth distribution in two orthogonal dimensions is used to fabricate crossed-grating-based EPEs with variable profile depth. Two EPEs with uniform profile depth and optimized variable profile depth are fabricated and measured. The results show that compared with using the EPE with uniform profile depth, using the EPE with optimized variable profile depth, the imaging brightness uniformity can be improved by 37.8%.
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