We report the useful approach toward the practical imaging solution for long-wavelength infrared (LWIR). In order to make use of the LWIR sensors conveniently in everyday life, the imaging module needs to be slim and small so that it can be mounted inside end-user devices without big difficulties. At the same time, the image qualities should have a sufficient level to guarantee that people can easily identify object shapes and recognize temperature differences when they see the resultant images. In this paper, we focus on those two crucial points for the practical LWIR imaging device. First, to make the compact optical system, we adopted a thin meta-surface lens of a focal length 2 mm which is showing the effective total top length (TTL) less than 3 mm. Second, to enhance the image sharpness degraded relatively due to the lens, the deep learning method of the U-net model is introduced. The patterns of the USAF resolution target chart indicate the increase of modulation value by 3~8 times after applying the learning process. We believe that our work helps to expand the pragmatic application area of the LWIR imaging sensors in the near future.
38nm half pitch pattern was replicated from Si master pattern to quartz blank template. It is a novel approach different
from typical quartz to quartz replication. This replication concept is expected to alleviate the burden not only in cost but
also resolution for NIL template fabrication. In this study, full field Si master fabricated by ArF immersion lithography,
UV-transparent hard mask for quartz blank template and core-out quartz blank template were applied to prove the
concept. And the replica template was evaluated with NIL and subsequent etching.
Patterning of sub-30 nm features using high resolution nano-imprint lithography (NIL) requires use of quartz
templates. To this end, various fabrication methods such as e-beam lithography, edge lithography, and focused ion beam
lithography were employed for the template formation. Despite significant advances using these methods, NIL
template formation process suffers from low throughput and high cost of fabrication when compared with the fabrication
of masks used in optical lithography. This is largely owing to a 4X difference in feature sizes involved for the
fabrication of NIL template and optical lithography mask. In this paper, we report on a simple, cost-effective method for
the fabrication of sub-30 nm NIL templates. Typical fabrication-time required for the formation of sub-30 nm HP
templates using conventional Gaussian beam electron beam lithography, runs into several days. Additionally, complicated
etch procedures must be employed for pattern transfer onto quartz substrates. Here we propose a low cost, simplified
fabrication process for the formation of high resolution NIL templates using wafer pattern replication. We fabricated sub-
30nmHP poly-silicon lines and spaces on silicon wafer using multiple patterning technique. These patterns were subsequently
transferred onto quartz substrates using NIL technique.
Several types of features were studied to realize a template using the triple patterning technique described above. Results of wafer printing using the said template will be discussed.
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