Dr. Cecilia Dupre
at CEA-LETI
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 5 March 2022 Presentation
Bertrand Szelag, Stéphanie Garcia, Jonathan Faugier-Tovar, Laetitia Adelmini, Munique Kazar Mendes, Sylvain Guerber, Léopold Virot, Daivid Fowler, André Myko, Cecilia Dupre, Quentin Wilmart
Proceedings Volume PC12004, PC1200406 (2022) https://doi.org/10.1117/12.2616166

Proceedings Article | 6 October 2021 Presentation + Paper
C. Besancon, D. Néel, G. Cerulo, D. Make, N. Vaissiere, F. Pommereau, F. Fournel, L. Sanchez, C. Dupré, V. Muffato, J. Decobert
Proceedings Volume 11880, 118800I (2021) https://doi.org/10.1117/12.2602126
KEYWORDS: Semiconducting wafers, Silicon, Wafer bonding, Coarse wavelength division multiplexing, Photonic integrated circuits

Proceedings Article | 5 March 2021 Presentation
Proceedings Volume 11690, 116900K (2021) https://doi.org/10.1117/12.2578550
KEYWORDS: Silicon photonics, Silicon, Photonics, Optical lithography, Line edge roughness, Wafer-level optics, Metrology, Line width roughness, Semiconducting wafers

Proceedings Article | 2 April 2020 Presentation
Karim Hassan, Bertrand Szelag, Laetitia Adelmini, Cécilia Dupré, Elodie Ghegin, Philippe Rodriguez, Fabrice Nemouchi, Pierre Brianceau, Antoine Schembri, David Carrara, Pierrick Cavalie, Florent Franchin, Marie-Christine Roure, Loic Sanchez, Christophe Jany, Segolène Olivier
Proceedings Volume 11364, 113640Y (2020) https://doi.org/10.1117/12.2558532
KEYWORDS: Laser applications, Silicon photonics, Wafer bonding, Semiconducting wafers, Optical lithography, Resistance, Back end of line, Transceivers, Data communications, Molecular beam epitaxy

Proceedings Article | 26 February 2020 Paper
Proceedings Volume 11284, 112840L (2020) https://doi.org/10.1117/12.2543489
KEYWORDS: Silicon, Fiber couplers, Waveguides, Optical design, Nanophotonics, Diffraction gratings, Metamaterials, Lithography, Interfaces, Deep ultraviolet

Proceedings Article | 3 April 2008 Paper
Proceedings Volume 6922, 69220F (2008) https://doi.org/10.1117/12.772675
KEYWORDS: Photoresist processing, Silicon, Line width roughness, FT-IR spectroscopy, Plasma, Semiconductors, Chemical analysis, Plasma etching, Process control, Optical lithography

Showing 5 of 6 publications
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