Dr. Daiju Shiono Profile

Dr. Daiju Shiono

at Tokyo Ohka Kogyo Co Ltd

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 26 March 2013 Paper

Perpendicular orientation of block-co-polymer on controlled neutralization layer

Daiju Shiono, Tsuyoshi Kurosawa, Kenichiro Miyashita, Tasuku Matsumiya, Ken Miyagi, Katsumi Ohmori

Proceedings Volume 8680, 86801Q (2013) https://doi.org/10.1117/12.2011638

KEYWORDS: Surface roughness, Polymers, Coating, Atomic force microscopy, Scanning electron microscopy, Surface properties, Chemical analysis, Thin film coatings, Phase measurement, Directed self assembly

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Decomposition analysis of molecular resists to further CD control

Daiju Shiono, Hideo Hada, Taku Hirayama, Junichi Onodera, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 7273, 727330 (2009) https://doi.org/10.1117/12.815173

KEYWORDS: Surface roughness, Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Coating, Molecules, Chemical analysis, Atomic force microscopy, Light sources, Spectroscopy

Read Abstract +

Proceedings Article | 12 April 2007 Paper

Distribution control of protecting groups and its effect on LER for EUV molecular resist

Daiju Shiono, Hideo Hada, Hiroto Yukawa, Hiroaki Oizumi, Iwao Nishiyama, Kyoko Kojima, Hiroshi Fukuda

Proceedings Volume 6519, 65193U (2007) https://doi.org/10.1117/12.711311

KEYWORDS: Line edge roughness, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Inspection, Scanning electron microscopy, Analytical research, Optical lithography, Silicon films, Silicon

Read Abstract +

Proceedings Article | 22 March 2007 Paper

Material design of negative-tone polyphenol resist for EUV and EB lithography

Kyoko Kojima, Shigeki Mori, Daiju Shiono, Hideo Hada, Junichi Onodera

Proceedings Volume 6519, 65191D (2007) https://doi.org/10.1117/12.711759

KEYWORDS: Lithography, Extreme ultraviolet lithography, Line edge roughness, Extreme ultraviolet, Semiconductors, Molybdenum, Polymers, Inspection, Chromatography, Molecules

Read Abstract +

Proceedings Article | 29 March 2006 Paper

Characteristics of low E_a 193-nm chemical amplification resists

Toshiyuki Ogata, Yohei Kinoshita, Sanae Furuya, Shogo Matsumaru, Motoki Takahashi, Daiju Shiono, Takahiro Dazai, Hideo Hada, Masamitsu Shirai

Proceedings Volume 6153, 615328 (2006) https://doi.org/10.1117/12.656199

KEYWORDS: Polymers, Plasma, Argon, Printing, Surface roughness, Lithography, FT-IR spectroscopy, Scanning electron microscopy, Photoresist processing, Electroluminescence

Read Abstract +

Proceedings Article | 29 March 2006 Paper

Molecular resists based on cholate derivatives for electron-beam lithography

Daiju Shiono, Taku Hirayama, Hideo Hada, Junichi Onodera, Tadashi Arai, Atsuko Yamaguchi, Kyoko Kojima, Hiroshi Shiraishi, Hiroshi Fukuda

Proceedings Volume 6153, 61532D (2006) https://doi.org/10.1117/12.656949

KEYWORDS: Lithography, Etching, Silicon, Silicon films, Semiconducting wafers, FT-IR spectroscopy, Line edge roughness, Absorbance, Glasses, Argon

Read Abstract +

Proceedings Article | 29 March 2006 Paper

Negative-tone polyphenol resist based on chemically amplified polarity change reaction with sub-50-nm resolution capability

Kyoko Kojima, Takashi Hattori, Hiroshi Fukuda, Taku Hirayama, Daiju Shiono, Hideo Hada, Junichi Onodera

Proceedings Volume 6153, 61530G (2006) https://doi.org/10.1117/12.656112

KEYWORDS: Line edge roughness, Lithography, Scanning electron microscopy, Etching, FT-IR spectroscopy, Potassium, Silicon, Extreme ultraviolet lithography, Inspection, Polymers

Read Abstract +

Proceedings Article | 4 May 2005 Paper

Development of electron beam resists based on amorphous polyphenols with low molecular weight and narrow dispersion

Taku Hirayama, Daiju Shiono, Shogo Matsumaru, Toshiyuki Ogata, Hideo Hada, Junichi Onodera, Tadashi Arai, Toshio Sakamizu, Atsuko Yamaguchi, Hiroshi Shiraishi, Hiroshi Fukuda, Mitsuru Ueda

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600416

KEYWORDS: Line edge roughness, Ions, Scanning electron microscopy, Lithography, Etching, Polymers, Electron beams, Silicon, Semiconducting wafers, Inspection

Read Abstract +

Showing 5 of 8 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years