Daniel T. Elg
at Univ of Illinois
SPIE Involvement:
Author
Publications (10)

SPIE Journal Paper | 7 April 2017
Daniel Elg, Gianluca Panici, Jason Peck, Shailendra Srivastava, David N. Ruzic
JM3, Vol. 16, Issue 02, 023501, (April 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.2.023501
KEYWORDS: Tin, Plasma, Ions, Hydrogen, Etching, Extreme ultraviolet, In situ metrology, Extreme ultraviolet lithography, Data modeling, Reflection

Proceedings Article | 18 March 2016 Paper
Proceedings Volume 9776, 97760M (2016) https://doi.org/10.1117/12.2219394
KEYWORDS: Oxidation, Tin, Hydrogen, Extreme ultraviolet, Etching, Plasma, Probability theory, EUV optics, Chemical species, Reflectivity, Mirrors, Ions, Neodymium, Extreme ultraviolet lithography

SPIE Journal Paper | 5 February 2016
John Sporre, Daniel Elg, Kishor Kalathiparambil, David Ruzic
JM3, Vol. 15, Issue 01, 013503, (February 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.1.013503
KEYWORDS: Chemical species, Tin, Argon, Scattering, Extreme ultraviolet, Plasma, Autoregressive models, Ions, Calibration, Microchannel plates

Proceedings Article | 6 April 2015 Paper
Proceedings Volume 9422, 94222H (2015) https://doi.org/10.1117/12.2085665
KEYWORDS: Plasma, Tin, Extreme ultraviolet, Reflectivity, Etching, Hydrogen, Ions, Plasma etching, Extreme ultraviolet lithography, Process modeling

SPIE Journal Paper | 9 February 2015
Daniel Elg, John Sporre, Davide Curreli, Ivan Shchelkanov, David Ruzic, Karl Umstadter
JM3, Vol. 14, Issue 01, 013506, (February 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.1.013506
KEYWORDS: Ions, Extreme ultraviolet, Magnetism, Plasma, Extreme ultraviolet lithography, Argon, Electrons, Metrology, Computer simulations, Lithography

Proceedings Article | 8 April 2013 Paper
Proceedings Volume 8679, 86792H (2013) https://doi.org/10.1117/12.2012584
KEYWORDS: Tin, Plasma, Contamination, Etching, Hydrogen, Oxygen, Extreme ultraviolet, Antennas, Carbon, Methane

Proceedings Article | 1 April 2013 Paper
David Ruzic, John Sporre, Dan Elg, Davide Curreli
Proceedings Volume 8679, 86790D (2013) https://doi.org/10.1117/12.2011612
KEYWORDS: Plasma, Argon, Extreme ultraviolet, Neon, Ions, Chemical species, Tin, Sensors, Scattering, Electrodes

Proceedings Article | 1 April 2013 Paper
D. Elg, J. Sporre, D. Curreli, D. Ruzic, K. Umstadter
Proceedings Volume 8679, 86792M (2013) https://doi.org/10.1117/12.2011519
KEYWORDS: Ions, Particles, Magnetism, Extreme ultraviolet, Error analysis, MATLAB, Plasma, Lithography, Manufacturing, Argon

Proceedings Article | 23 March 2012 Paper
Daniel Andruczyk, John Sporre, Dan Elg, Tae Cho, David Ruzic
Proceedings Volume 8322, 832237 (2012) https://doi.org/10.1117/12.916437
KEYWORDS: Ions, Sensors, Extreme ultraviolet, Calibration, Plasmas, Light sources, Oscilloscopes, Xenon, Microchannel plates, Visualization

Proceedings Article | 23 March 2012 Paper
J. Sporre, D. Elg, D. Andruczyk, T. Cho, D. Ruzic, S. Srivastava, D. Brandt
Proceedings Volume 8322, 83222L (2012) https://doi.org/10.1117/12.916434
KEYWORDS: Etching, Tin, Plasma, Semiconducting wafers, Hydrogen, Silicon, Extreme ultraviolet, Sputter deposition, EUV optics, Plasma etching

Showing 5 of 10 publications
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