Dr. Karl R. Umstadter Profile

Dr. Karl R. Umstadter

at ASML San Diego

SPIE Involvement:

Author

Area of Expertise:

Plasma Physics , Material Science , Vacuum Science & Technology , System s Engineering , Laser, Gas & Cryogen Safety , Diagnostics & Metrology

Publications (4)

SPIE Journal Paper | 6 December 2024

Next step in Moore’s law: high NA EUV system overview and first imaging and overlay performance

Jan van Schoot, Rob van Ballegoij, Hans Butler, Eelco van Setten, Guido Schiffelers, Wim Bouman, Simon van Gorp, Karl Umstadter, Joerg Zimmermann, Daniel Golde, Jens Timo Neumann, Paul Graeupner

JM3, Vol. 24, Issue 01, 011009, (December 2024) https://doi.org/10.1117/12.10.1117/1.JMM.24.1.011009

KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Reticles, Scanners, Mirrors, Sensors, Light sources and illumination, Design, Imaging systems, Extreme ultraviolet lithography

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Proceedings Article | 28 April 2023 Presentation + Paper

EUV light source for high-NA and low-NA lithography

Karl Umstadter, Matthew Graham, Michael Purvis, Alex Schafgans, Jayson Stewart, Peter Mayer, Daniel Brown

Proceedings Volume 12494, 124940Z (2023) https://doi.org/10.1117/12.2657772

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, High volume manufacturing, Plasma, Light sources, Gas lasers, Scanners, Tin, EUV optics

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SPIE Journal Paper | 9 February 2015

Magnetic debris mitigation system for extreme ultraviolet sources

Daniel Elg, John Sporre, Davide Curreli, Ivan Shchelkanov, David Ruzic, Karl Umstadter

JM3, Vol. 14, Issue 01, 013506, (February 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.1.013506

KEYWORDS: Ions, Extreme ultraviolet, Magnetism, Plasma, Extreme ultraviolet lithography, Argon, Electrons, Metrology, Computer simulations, Lithography

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Proceedings Article | 1 April 2013 Paper

Magnetic mitigation of debris for EUV sources

D. Elg, J. Sporre, D. Curreli, D. Ruzic, K. Umstadter

Proceedings Volume 8679, 86792M (2013) https://doi.org/10.1117/12.2011519

KEYWORDS: Ions, Particles, Magnetism, Extreme ultraviolet, Error analysis, MATLAB, Plasma, Lithography, Manufacturing, Argon

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