Dong-Seok Nam
at ASML
SPIE Involvement:
Conference Program Committee | Author
Publications (8)

Proceedings Article | 1 December 2022 Presentation + Paper
Adam Lyons, Tom Wallow, Dong-Seok Nam, Gisung Yoon, Baorui Yang, Mike Hermes
Proceedings Volume 12293, 122930M (2022) https://doi.org/10.1117/12.2643523
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Reticles, Stochastic processes, Metrology, Extreme ultraviolet lithography, Image analysis

Proceedings Article | 1 December 2022 Paper
Proceedings Volume 12293, 122930C (2022) https://doi.org/10.1117/12.2642302
KEYWORDS: Photomasks, Semiconducting wafers, Calibration, Data modeling, Line width roughness, Logic, Optical lithography, Extreme ultraviolet lithography, Critical dimension metrology, Stochastic processes

Proceedings Article | 31 October 2022 Poster
Proceedings Volume PC12292, PC122920Y (2022) https://doi.org/10.1117/12.2645263
KEYWORDS: Extreme ultraviolet, Ruthenium, Phase shifts, Photomasks, Stochastic processes, Resolution enhancement technologies, Extreme ultraviolet lithography, Double patterning technology, Reticles, Optical lithography

Proceedings Article | 16 September 2022 Paper
Proceedings Volume 12325, 1232502 (2022) https://doi.org/10.1117/12.2651194
KEYWORDS: Photomasks, Critical dimension metrology, Tolerancing, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Stochastic processes, Semiconducting wafers, Lithographic illumination

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12051, PC1205107 (2022) https://doi.org/10.1117/12.2614677
KEYWORDS: Extreme ultraviolet, Photomasks, Interfaces, Extreme ultraviolet lithography, Reticles, Multilayers, Visualization, Systems modeling, Resolution enhancement technologies, Prototyping

Showing 5 of 8 publications
Conference Committee Involvement (3)
Photomask Technology 2024
30 September 2024 | Monterey, California, United States
Photomask Technology 2023
2 October 2023 | Monterey, California, United States
Photomask Technology 2022
26 September 2022 | Monterey, California, United States
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