Franck Foussadier
RET Engineer at STMicroelectronics
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 24 March 2016 Paper
P. Fanton, J. C. Le Denmat, C. Gardiola, A. Pelletier, F. Foussadier, C. Gardin, J. Planchot, A. Szucs, O. Ndiaye, N. Martin, L. Depre, F. Robert
Proceedings Volume 9778, 97781U (2016) https://doi.org/10.1117/12.2218916
KEYWORDS: 3D modeling, Optical proximity correction, Metals, 3D metrology, Optical lithography, Evolutionary algorithms, Photomasks, Scanning electron microscopy, Critical dimension metrology, Image processing, Etching, Calibration, Artificial intelligence, Reliability

Proceedings Article | 13 March 2012 Paper
Charlotte Beylier, Nicolas Martin, Vincent Farys, Franck Foussadier, Emek Yesilada, Frederic Robert, Stanislas Baron, Russell Dover, Hua-yu Liu
Proceedings Volume 8326, 832616 (2012) https://doi.org/10.1117/12.916168
KEYWORDS: SRAF, Source mask optimization, Lithography, Optical proximity correction, Photomasks, Resolution enhancement technologies, Scanning electron microscopy, Lithium, Image enhancement, Computational lithography

Proceedings Article | 8 April 2011 Paper
Proceedings Volume 7969, 79691P (2011) https://doi.org/10.1117/12.869830
KEYWORDS: Optical proximity correction, Detection and tracking algorithms, Computer simulations, Extreme ultraviolet, Genetic algorithms, Standards development, Photomasks, Extreme ultraviolet lithography, Lithography, Lanthanum

Proceedings Article | 3 April 2010 Paper
J. Le Denmat, V. Charbois, L. Tetar, M. Luche, G. Kerrien, F. Robert, E. Yesilada, F. Foussadier, L. Couturier, L. Karsenti, M. Geshel
Proceedings Volume 7641, 76410Y (2010) https://doi.org/10.1117/12.848763
KEYWORDS: Semiconducting wafers, Inspection, Wafer inspection, Optical alignment, Defect inspection, Finite element methods, Statistical analysis, Optical proximity correction, Etching, Control systems

Proceedings Article | 23 March 2009 Paper
Proceedings Volume 7272, 72721G (2009) https://doi.org/10.1117/12.812955
KEYWORDS: Mahalanobis distance, Critical dimension metrology, Optical proximity correction, Calibration, Fuzzy logic, Data modeling, Reliability, Scanning electron microscopy, Lithography, Optics manufacturing

Proceedings Article | 16 March 2009 Paper
Franck Foussadier, Emek Yesilada, Jean-Christophe Le Denmat, Yorick Trouiller, Vincent Farys, Frédéric Robert, Gurwan Kerrien, Christian Gardin, Loic Perraud, Florent Vautrin, Alexandre Villaret, Catherine Martinelli, Jonathan Planchot, Jean Luc Di-Maria, Mazen Saied, Mame Kouna Top
Proceedings Volume 7274, 727416 (2009) https://doi.org/10.1117/12.814047
KEYWORDS: Optical proximity correction, Critical dimension metrology, Computer simulations, Optical simulations, Optical lithography, Current controlled current source, Optical imaging, Databases, Process modeling, Photomasks

Proceedings Article | 19 May 2008 Paper
F. Sundermann, F. Foussadier, T. Takigawa, J. Wiley, A. Vacca, L. Depre, G. Chen, S. Bai, J.-S. Wang, R. Howell, V. Arnoux, K. Hayano, S. Narukawa, S. Kawashima, H. Mohri, N. Hayashi, H. Miyashita, Y. Trouiller, F. Robert, F. Vautrin, G. Kerrien, J. Planchot, C. Martinelli, J. L. Di-Maria, V. Farys, B. Vandewalle, L. Perraud, J. C. Le Denmat, A. Villaret, C. Gardin, E. Yesilada, M. Saied
Proceedings Volume 7028, 70280U (2008) https://doi.org/10.1117/12.793037
KEYWORDS: Photomasks, Semiconducting wafers, Bridges, Scanning electron microscopy, Critical dimension metrology, Process modeling, Optical proximity correction, Reticles, Model-based design, Logic

Proceedings Article | 22 March 2008 Paper
Bertrand Le Gratiet, Pascal Gouraud, Enrique Aparicio, Laurene Babaud, Karen Dabertrand, Mathieu Touchet, Stephanie Kremer, Catherine Chaton, Franck Foussadier, Frank Sundermann, Jean Massin, Jean-Damien Chapon, Maxime Gatefait, Blandine Minghetti, Jean de-Caunes, Daniel Boutin
Proceedings Volume 6922, 69220Z (2008) https://doi.org/10.1117/12.776889
KEYWORDS: Semiconducting wafers, Etching, Critical dimension metrology, Optical lithography, Scatterometry, Reticles, Scanners, Photomasks, Process control, Immersion lithography

Proceedings Article | 12 March 2008 Paper
V. Farys, F. Robert, C. Martinelli, Y. Trouiller, F. Sundermann, C. Gardin, J. Planchot, G. Kerrien, F. Vautrin, M. Saied, E. Yesilada, F. Foussadier, A. Villaret, L. Perraud, B. Vandewalle, J. C. Le Denmat, M. K. Top
Proceedings Volume 6924, 69242Z (2008) https://doi.org/10.1117/12.774091
KEYWORDS: SRAF, Optical proximity correction, Lithography, Eye, Photomasks, Immersion lithography, Manufacturing, Logic, Switching, Printing

Proceedings Article | 16 November 2007 Paper
Mazen Saied, Franck Foussadier, Jérôme Belledent, Yorick Trouiller, Isabelle Schanen, Emek Yesilada, Christian Gardin, Jean Christophe Urbani, Frank Sundermann, Frédéric Robert, Christophe Couderc, Florent Vautrin, Laurent LeCam, Gurwan Kerrien, Jonathan Planchot, Catherine Martinelli, Bill Wilkinson, Yves Rody, Amandine Borjon, Nicolo Morgana, Jean-Luc Di-Maria, Vincent Farys
Proceedings Volume 6730, 673050 (2007) https://doi.org/10.1117/12.752613
KEYWORDS: Photomasks, Optical proximity correction, 3D modeling, Semiconducting wafers, Diffraction, Scattering, Near field, Lithographic illumination, Systems modeling, Near field optics

Proceedings Article | 1 November 2007 Paper
Frank Foussadier, Frank Sundermann, Anthony Vacca, Jim Wiley, George Chen, Tadahiro Takigawa, Katsuya Hayano, Syougo Narukawa, Satoshi Kawashima, Hiroshi Mohri, Naoya Hayashi, Hiroyuki Miyashita, Y. Trouiller, F. Robert, F. Vautrin, G. Kerrien, J. Planchot, C. Martinelli, J.L. Di-Maria, Vincent Farys
Proceedings Volume 6730, 673051 (2007) https://doi.org/10.1117/12.752609
KEYWORDS: Photomasks, Optical proximity correction, Data modeling, Semiconducting wafers, Process modeling, Critical dimension metrology, Lithography, Model-based design, Wafer-level optics, Scanning electron microscopy

Proceedings Article | 14 May 2007 Paper
Proceedings Volume 6607, 66071C (2007) https://doi.org/10.1117/12.728960
KEYWORDS: SRAF, Optical proximity correction, Printing, Optical lithography, Silicon, Photomasks, Semiconducting wafers, Inspection, Optical simulations, Lithography

Proceedings Article | 3 May 2007 Paper
Frank Sundermann, Yorick Trouiller, Jean-Christophe Urbani, Christophe Couderc, Jérôme Belledent, Amandine Borjon, Franck Foussadier, Christian Gardin, Laurent LeCam, Yves Rody, Mazen Saied, Emek Yesilada, Catherine Martinelli, Bill Wilkinson, Florent Vautrin, Nicolo Morgana, Frederic Robert, Patrick Montgomery, Gurwan Kerrien, Jonathan Planchot, Vincent Farys, Jean-Luc Di Maria
Proceedings Volume 6533, 65330E (2007) https://doi.org/10.1117/12.736927
KEYWORDS: Optical proximity correction, Reticles, Metals, Photoresist processing, Semiconducting wafers, Critical dimension metrology, Metrology, Manufacturing, Cadmium, Semiconductors

Proceedings Article | 27 March 2007 Paper
M. Saied, F. Foussadier, J. Belledent, Y. Trouiller, I. Schanen, C. Gardin, J. C. Urbani, P. K. Montgomery, F. Sundermann, F. Robert, C. Couderc, F. Vautrin, G. Kerrien, J. Planchot, E. Yesilada, C. Martinelli, B. Wilkinson, A. Borjon, L. Le-Cam, J. L. Di-Maria, Y. Rody, N. Morgana, Vincent Farys
Proceedings Volume 6520, 65204Q (2007) https://doi.org/10.1117/12.715120
KEYWORDS: 3D modeling, Photomasks, Optical proximity correction, Polarization, Process modeling, Lithium, Optical lithography, Information technology, Semiconducting wafers, Semiconductors

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 634919 (2006) https://doi.org/10.1117/12.686666
KEYWORDS: Calibration, Process modeling, Data modeling, Optical proximity correction, Mathematical modeling, Photoresist processing, Model-based design, Photomasks, Image processing, Image quality

Proceedings Article | 21 March 2006 Paper
Proceedings Volume 6154, 61544D (2006) https://doi.org/10.1117/12.657056
KEYWORDS: Immersion lithography, Lithography, Calibration, Optical proximity correction, Printing, Optical transfer functions, Data modeling, Process modeling, Convolution, Optical lithography

Proceedings Article | 5 November 2005 Paper
Proceedings Volume 5992, 599219 (2005) https://doi.org/10.1117/12.632096
KEYWORDS: Data modeling, Calibration, Statistical modeling, Printing, Critical dimension metrology, Electroluminescence, Convolution, Modeling, Mathematical modeling, Computer simulations

Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617433
KEYWORDS: Critical dimension metrology, Etching, Photomasks, Convolution, Optical proximity correction, Electrons, Point spread functions, Optical lithography, Scattering, Light scattering

Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617412
KEYWORDS: Optical proximity correction, Resolution enhancement technologies, Multilayers, Optical lithography, Photomasks, Optics manufacturing, Semiconducting wafers, Metals, Manufacturing, Lithography

Proceedings Article | 5 May 2005 Paper
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.600887
KEYWORDS: Transistors, Ions, Optical proximity correction, Lithography, Optical lithography, Lithium, Logic, Photomasks, Lithographic illumination, Manufacturing

Showing 5 of 20 publications
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