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Garima Sharma
at KLA-Tencor Software India Private Ltd
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Publications (2)
Proceedings Article | 10 April 2024 Poster + Paper
Hotspot discovery and variability analysis for advanced EUV processes
Kaushik Sah, Zhijin Chen, Yao Zhang, Liming Zhang, Cao Zhang, Craig Higgins, Anatoly Burov, Guy Parsey, Pradeep Vukkadala, Roel Gronheid, Arpit Jain, Ramakanth Ramini, Ankur Agrawal, Garima Sharma, Andrew Cross, Syamashree Roy, Victor Blanco
Proceedings Volume 12955, 129553H (2024) https://doi.org/10.1117/12.3011178
KEYWORDS: Stochastic processes, Scanning electron microscopy, Design, Semiconducting wafers, Inspection, Metrology, Extreme ultraviolet lithography, Defect inspection
Proceedings Article | 23 March 2020 Paper
Optical defect inspection solution for EUV stochastics detection
Vidyasagar Anantha, Raghav Babulnath, Veikunth Kannan, Garima Sharma, Shubham Kumar, Kaushik Sah, Andrew Cross, Rahul Lakhawat, Hari Pathangi, Peter De Bisschop
Proceedings Volume 11323, 113231J (2020) https://doi.org/10.1117/12.2552452
KEYWORDS: Stochastic processes, Inspection, Extreme ultraviolet, Semiconducting wafers, Modulation, EUV optics, Defect inspection, Wafer-level optics, Defect detection
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