Dr. Victor M. Blanco Carballo
at imec
SPIE Involvement:
Author
Publications (45)

Proceedings Article | 12 November 2024 Presentation + Paper
Proceedings Volume 13216, 1321604 (2024) https://doi.org/10.1117/12.3047176
KEYWORDS: Metals, Optical lithography, Logic, Semiconducting wafers, Extreme ultraviolet lithography, Etching, Scanning electron microscopy, Lithography, Tin

Proceedings Article | 12 November 2024 Presentation + Paper
Proceedings Volume 13215, 132150N (2024) https://doi.org/10.1117/12.3034701
KEYWORDS: Optical lithography, Extreme ultraviolet, Directed self assembly, Sustainability, Stochastic processes, Phase shifts, Materials processing, Lithography, Extreme ultraviolet lithography, Design

Proceedings Article | 12 November 2024 Presentation + Paper
Proceedings Volume 13215, 132150B (2024) https://doi.org/10.1117/12.3034189
KEYWORDS: Transmission electron microscopy, Scanning electron microscopy, Etching, Defect detection, Defect inspection, Extreme ultraviolet lithography, Metrology, Inspection, Semiconducting wafers, Optical lithography

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume PC12953, PC129530M (2024) https://doi.org/10.1117/12.3012722
KEYWORDS: Optical lithography, Reticles, Extreme ultraviolet, Process control, Critical dimension metrology, Computational lithography, Design and modelling, Optical proximity correction, Imaging systems, Tantalum

Proceedings Article | 10 April 2024 Presentation + Paper
Syamashree Roy, Arame Thiam, Kaushik Sah, Yannick Feurprier, Nobuyuki Fukui, Kathleen Nafus, Kenichi Miyaguchi, Dieter Van den Heuvel, Balakumar Baskaran, Joost Bekaert, Andrew Cross, Mircea Dusa, Victor Blanco Carballo
Proceedings Volume 12953, 129530X (2024) https://doi.org/10.1117/12.3010868
KEYWORDS: Optical lithography, Semiconducting wafers, Logic, Scanning electron microscopy, Lithography, Design, Extreme ultraviolet

Proceedings Article | 10 April 2024 Poster
Proceedings Volume 12955, 129553V (2024) https://doi.org/10.1117/12.3023126
KEYWORDS: Object detection, Semiconductor manufacturing, Machine learning, Scanning electron microscopy, Defect detection, Data modeling, Semiconductors, Education and training, Semiconducting wafers, Moores law

Proceedings Article | 10 April 2024 Presentation + Paper
Eren Canga, Victor Blanco, Anne-Laure Charley, Cyrus Tabery, Gabriel Zacca, Nader Shamma, Benjamin Kam, Mohand Brouri
Proceedings Volume 12955, 129551R (2024) https://doi.org/10.1117/12.3010115
KEYWORDS: Overlay metrology, Etching, Photoresist materials, Extreme ultraviolet lithography, Lithography, Diffraction gratings, Diffraction, Reproducibility, Photoresist developing, Metrology

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12955, 129550W (2024) https://doi.org/10.1117/12.3010940
KEYWORDS: Education and training, Image resolution, Defect detection, Data modeling, Scanning electron microscopy, Defect inspection, Machine learning, Image processing, Semiconductors, Extreme ultraviolet lithography

Proceedings Article | 10 April 2024 Poster + Paper
Kaushik Sah, Zhijin Chen, Yao Zhang, Liming Zhang, Cao Zhang, Craig Higgins, Anatoly Burov, Guy Parsey, Pradeep Vukkadala, Roel Gronheid, Arpit Jain, Ramakanth Ramini, Ankur Agrawal, Garima Sharma, Andrew Cross, Syamashree Roy, Victor Blanco
Proceedings Volume 12955, 129553H (2024) https://doi.org/10.1117/12.3011178
KEYWORDS: Stochastic processes, Scanning electron microscopy, Design, Semiconducting wafers, Inspection, Metrology, Extreme ultraviolet lithography, Defect inspection

Proceedings Article | 10 April 2024 Presentation + Paper
D. Cerbu, V. Blanco Carballo, F. Schleicher, J. van de Kerkhove, P. Leray, N. Kissoon, E. De Poortere
Proceedings Volume 12955, 129551C (2024) https://doi.org/10.1117/12.3011142
KEYWORDS: Semiconducting wafers, Machine learning, Image processing, Design, Scanning electron microscopy

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12955, 129550O (2024) https://doi.org/10.1117/12.3010421
KEYWORDS: Semiconducting wafers, Overlay metrology, Cross validation, Process control, Logic, Metrology, Simulations, Scanning electron microscopy, Lithography

Proceedings Article | 9 April 2024 Presentation + Paper
Van Tuong Pham, Jeonghoon Lee, Kaushik Sah, Ying-Lin Chen, Seonggil Heo, Soobin Hwang, Kenichi Miyaguchi, Bappaditya Dey, Maria Chistiakova, Peter De Schepper, Philippe Bezard, Sara Paolillo, Danilo De Simone, Hyo Seon Suh, Victor Blanco
Proceedings Volume 12957, 129570V (2024) https://doi.org/10.1117/12.3010934
KEYWORDS: Printing, Extreme ultraviolet, Optical lithography, Etching, Extreme ultraviolet lithography, Design, Cadmium, Source mask optimization, Scanning electron microscopy, Semiconducting wafers

Proceedings Article | 22 November 2023 Presentation
Cyrus Tabery, Miao Wang, Victor Blanco Carballo, Eren Canga, Aiqin Jiang, Chris Spence, Tom Wallow
Proceedings Volume PC12750, PC127500B (2023) https://doi.org/10.1117/12.2688141
KEYWORDS: Electron beam lithography, Metrology, Design and modelling, Scanning laser ophthalmoscopy, Scanning electron microscopy, Line width roughness, Image enhancement, Failure analysis, Extreme ultraviolet, Etching

Proceedings Article | 22 November 2023 Presentation
Proceedings Volume PC12750, PC1275004 (2023) https://doi.org/10.1117/12.2687539
KEYWORDS: Error analysis, Defect detection, Manufacturing, Extreme ultraviolet lithography, Extreme ultraviolet, Thermal stability, Temperature control, Simulations, Scanning electron microscopy, Photovoltaics

SPIE Journal Paper | 19 October 2023
Victor Blanco Carballo, Etienne De Poortere, Philippe Leray, Dorin Cerbu, Jeroen van de Kerkhove, Nicola Kissoon
JM3, Vol. 22, Issue 04, 041604, (October 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041604
KEYWORDS: Metals, Design rules, Design, Critical dimension metrology, Scanning electron microscopy, Diffractive optical elements, Extreme ultraviolet, Etching, Optical lithography, Transmission electron microscopy

Proceedings Article | 5 October 2023 Paper
Proceedings Volume 12802, 1280208 (2023) https://doi.org/10.1117/12.2680884
KEYWORDS: Contour extraction, Scanning electron microscopy, Image quality, Deep learning, Denoising, Image processing, Data modeling, Image denoising, Defect detection

Proceedings Article | 30 April 2023 Presentation
Proceedings Volume 12496, 124961Q (2023) https://doi.org/10.1117/12.2658541
KEYWORDS: Image denoising, Denoising, Semiconductors, Scanning electron microscopy, Resistance, Failure analysis, Electrodes, Capacitance, Calibration

Proceedings Article | 28 April 2023 Paper
Proceedings Volume 12495, 124950S (2023) https://doi.org/10.1117/12.2660763
KEYWORDS: Optical lithography, Extreme ultraviolet, Optical proximity correction, Design and modelling, SRAF, Semiconducting wafers, Inspection, Source mask optimization, Printing, Electronic design automation

Proceedings Article | 27 April 2023 Presentation + Paper
Proceedings Volume 12496, 124960I (2023) https://doi.org/10.1117/12.2658084
KEYWORDS: Ruthenium, Optical alignment, Semiconducting wafers, Overlay metrology, Oxides, Silicon, Metals, Etching, Scanners, Copper

SPIE Journal Paper | 28 October 2022
JM3, Vol. 21, Issue 04, 044901, (October 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.044901
KEYWORDS: Semiconducting wafers, Metals, Critical dimension metrology, Oxides, Scatterometry, Inspection, Stochastic processes, Electron beam lithography, Metrology, Ruthenium

SPIE Journal Paper | 13 October 2022
JM3, Vol. 21, Issue 04, 043201, (October 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.043201
KEYWORDS: Semiconducting wafers, Overlay metrology, Distortion, Thin films, Optical alignment, Scanning electron microscopy, Sensors, Photomasks, Data modeling, Optical parametric oscillators

Proceedings Article | 26 May 2022 Presentation + Paper
Manjusha Mehendale, Andy Antonelli, Robin Mair, Priya Mukundhan, Janusz Bogdanowicz, Victor Blanco, Anne-Laure Charley, Philippe Leray
Proceedings Volume 12053, 1205313 (2022) https://doi.org/10.1117/12.2614295
KEYWORDS: Acoustics, Optical alignment, Ruthenium, Picosecond phenomena, Microscopy, Principal component analysis, Raster graphics, Metals

Proceedings Article | 26 May 2022 Presentation + Paper
I. Battisti, K. Makles, M. S. Mucientes, Y. Guo, E. Simons, J. Bogdanowicz, A. Moussa, V. Blanco, F. Yasin, D. Crotti, A.-L. Charley, P. Leray, M. van Reijzen, C. Bozdog, H. Sadeghian
Proceedings Volume 12053, 1205310 (2022) https://doi.org/10.1117/12.2616093
KEYWORDS: Overlay metrology, Semiconducting wafers, Opacity, Atomic force microscopy, Scanning probe metrology, Image resolution, Pixel resolution, Photomasks

Proceedings Article | 25 May 2022 Poster + Presentation + Paper
Hiroki Tadatomo, Arnaud Dauendorffer, Tomoya Onitsuka, Hisashi Genjima, Yasuyuki Ido, Soichiro Okada, Yuhei Kuwahara, Arisa Hara, Congque Dinh, Seiji Fujimoto, Shinichiro Kawakami, Makoto Muramatsu, Satoru Shimura, Kathleen Nafus, Noriaki Oikawa, Kenta Ono, Yannick Feurprier, Marc Demand, Ainhoa Romo Negreira, Seiji Nagahara, Blanco Victor, Philippe Foubert, Danilo De Simone
Proceedings Volume 12056, 120560F (2022) https://doi.org/10.1117/12.2614012
KEYWORDS: Etching, Optical lithography, Extreme ultraviolet, Bridges, Extreme ultraviolet lithography, Inspection, Image processing

Proceedings Article | 12 October 2021 Poster + Presentation + Paper
Proceedings Volume 11854, 1185418 (2021) https://doi.org/10.1117/12.2600938
KEYWORDS: Etching, Logic, Critical dimension metrology, Inspection, Extreme ultraviolet lithography, Semiconducting wafers, Electron beam lithography, Optical lithography, Metrology, Diffractive optical elements

Proceedings Article | 22 February 2021 Poster + Paper
Proceedings Volume 11611, 116112H (2021) https://doi.org/10.1117/12.2585779
KEYWORDS: Extreme ultraviolet, Optical lithography, Scanning electron microscopy, Stochastic processes, Lithography, Back end of line, Ultraviolet radiation, Photomasks, Optical inspection, Metals

Proceedings Article | 24 March 2020 Presentation
Proceedings Volume 11329, 113290U (2020) https://doi.org/10.1117/12.2569606

Proceedings Article | 16 October 2019 Presentation
Victor Blanco Carballo, Sara Paolillo, Marleen van der Veen, Stephane Lariviere, Gian Lorusso, Etienne de Poortere, Cyrus Tabery, Fu Qiao, shu-yu lai, marc kea, Luke wang, yu-chi Su, Joe Oh, jim huang, jimmy chen, jonathan huang
Proceedings Volume 11147, 111470B (2019) https://doi.org/10.1117/12.2536943
KEYWORDS: Inspection, Extreme ultraviolet, Metrology, Etching, Chemical mechanical planarization, Polishing, Logic, Optical alignment, Overlay metrology, Copper

Proceedings Article | 26 September 2019 Presentation + Paper
Proceedings Volume 11147, 111470E (2019) https://doi.org/10.1117/12.2537104
KEYWORDS: Diffraction, Extreme ultraviolet lithography, Metals, Photomasks, Semiconducting wafers, Nanoimprint lithography, Optical proximity correction, Extreme ultraviolet, Phase modulation, Phase shift keying

Proceedings Article | 26 March 2019 Presentation + Paper
Pieter Vanelderen, Victor Blanco, Ming Mao, Yoann Tomczak, David de Roest, Nicola Kissoon, Paulina Rincon Delgadillo, Gijsbert Rispens, Guido Schiffelers, Abhinav Pathak, Frederic Lazzarino, Danilo De Simone, Etienne de Poortere, Moyra Mc Manus, Daniele Piumi, Eric Hendrickx, Geert Vandenberghe
Proceedings Volume 10957, 109570S (2019) https://doi.org/10.1117/12.2515503
KEYWORDS: Etching, Lithography, Extreme ultraviolet lithography, Photoresist materials, Logic, Optical lithography

Proceedings Article | 25 March 2019 Presentation + Paper
S. Decoster, F. Lazzarino, D. Vangoidsenhoven, V. B. Carballo, A.-H. Tamaddon, E. Kesters, C. Lorant
Proceedings Volume 10960, 109600L (2019) https://doi.org/10.1117/12.2515173
KEYWORDS: Optical lithography, Amorphous silicon, Photomasks, Oxides, Scanning electron microscopy, Etching, Extreme ultraviolet, Extreme ultraviolet lithography, Atomic layer deposition

Proceedings Article | 3 October 2018 Presentation + Paper
Proceedings Volume 10809, 108090N (2018) https://doi.org/10.1117/12.2503321
KEYWORDS: Source mask optimization, Semiconducting wafers, Scanners, Logic, Extreme ultraviolet lithography, Reticles, Extreme ultraviolet

Proceedings Article | 23 March 2018 Presentation + Paper
Stéphane Larivière, Christopher Wilson, Bogumila Kutrzeba Kotowska, Janko Versluijs, Stefan Decoster, Ming Mao, Marleen van der Veen, Nicolas Jourdan, Zaid El-Mekki, Nancy Heylen, Els Kesters, Patrick Verdonck, Christophe Béral, Dieter Van den Heuvel, Peter De Bisschop, Joost Bekaert, Victor Blanco, Ivan Ciofi, Danny Wan, Basoene Briggs, Arindam Mallik, Eric Hendrickx, Ryoung-han Kim, Greg McIntyre, Kurt Ronse, Jürgen Bömmels, Zsolt Tőkei, Dan Mocuta
Proceedings Volume 10583, 105830U (2018) https://doi.org/10.1117/12.2299389
KEYWORDS: Extreme ultraviolet, Optical lithography, Etching, Tin, Resistance, Metals, Semiconducting wafers, Critical dimension metrology, Photomasks, Copper

Proceedings Article | 21 March 2018 Presentation + Paper
Proceedings Volume 10583, 105830L (2018) https://doi.org/10.1117/12.2299639
KEYWORDS: Etching, Tin, SRAF, Optical lithography, Logic, Extreme ultraviolet, Photomasks, Stochastic processes, Scanning electron microscopy, Photoresist processing

Proceedings Article | 20 March 2018 Presentation + Paper
Ryoung-han Kim, Yasser Sherazi, Peter Debacker, Praveen Raghavan, Julien Ryckaert, Arindam Malik, Diederik Verkest, Jae Uk Lee, Werner Gillijns, Ling Ee Tan, Victor Blanco, Kurt Ronse, Greg McIntyre
Proceedings Volume 10588, 105880N (2018) https://doi.org/10.1117/12.2299335
KEYWORDS: Optical lithography, Extreme ultraviolet, Metals, Logic, Manufacturing, Lithography, Back end of line, Extreme ultraviolet lithography, New and emerging technologies

Proceedings Article | 19 March 2018 Presentation + Paper
Proceedings Volume 10583, 105830G (2018) https://doi.org/10.1117/12.2299504
KEYWORDS: Optical lithography, Scanning electron microscopy, Extreme ultraviolet lithography, Lithography, Critical dimension metrology, Photoresist materials, Extreme ultraviolet, Line edge roughness, Metrology, Line width roughness

Proceedings Article | 16 October 2017 Presentation
Proceedings Volume 10450, 1045004 (2017) https://doi.org/10.1117/12.2281738
KEYWORDS: Photomasks, Extreme ultraviolet, Optical lithography, Logic, Optical proximity correction, SRAF, Data conversion, Metals, Manufacturing, Semiconducting wafers

Proceedings Article | 26 April 2017 Presentation + Paper
Proceedings Volume 10148, 101480V (2017) https://doi.org/10.1117/12.2257885
KEYWORDS: Photomasks, Logic, Etching, SRAF, Extreme ultraviolet, Optical lithography, Metals, Computational lithography, Optical proximity correction, Semiconductor manufacturing

Proceedings Article | 7 April 2017 Presentation + Paper
Proceedings Volume 10143, 101430U (2017) https://doi.org/10.1117/12.2261741
KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Photoresist developing, Optical lithography, Extreme ultraviolet, High volume manufacturing, Resolution enhancement technologies, Photomasks, Photoresist processing, Semiconducting wafers, Etching

Proceedings Article | 28 March 2017 Paper
Proceedings Volume 10148, 101480J (2017) https://doi.org/10.1117/12.2257924
KEYWORDS: Etching, Photomasks, Metals, Extreme ultraviolet lithography, Dielectrics, Optical proximity correction, Immersion lithography, Lithography, Source mask optimization, Extreme ultraviolet, Line edge roughness

Proceedings Article | 24 March 2017 Presentation + Paper
Proceedings Volume 10143, 101430H (2017) https://doi.org/10.1117/12.2258004
KEYWORDS: Optical lithography, Extreme ultraviolet, Back end of line, Metals, Logic, Extreme ultraviolet lithography, Etching, Double patterning technology, Lithography, Photomasks, Stochastic processes, System on a chip, Semiconducting wafers, Critical dimension metrology

Proceedings Article | 24 March 2017 Presentation + Paper
Proceedings Volume 10143, 1014314 (2017) https://doi.org/10.1117/12.2258003
KEYWORDS: Metals, Extreme ultraviolet, Optical proximity correction, Extreme ultraviolet lithography, Reticles, Optical lithography, Calibration, Source mask optimization, Photomasks, SRAF, Semiconducting wafers

Proceedings Article | 24 March 2017 Presentation + Paper
V. Blanco Carballo, J. Bekaert, M. Mao, B. Kutrzeba Kotowska, S. Larivière, I. Ciofi, R. Baert, R. H. Kim, E. Gallagher, E. Hendrickx, L. E. Tan, W. Gillijns, D. Trivkovic, P. Leray, S. Halder, M. Gallagher, F. Lazzarino, S. Paolillo, D. Wan, A. Mallik, Y. Sherazi, G. McIntyre, M. Dusa, P. Rusu, T. Hollink, T. Fliervoet, F. Wittebrood
Proceedings Volume 10143, 1014318 (2017) https://doi.org/10.1117/12.2258005
KEYWORDS: Metals, Extreme ultraviolet lithography, Optical lithography, Back end of line, Extreme ultraviolet, Etching, Semiconducting wafers, Logic, Critical dimension metrology, Tin

Proceedings Article | 24 March 2017 Paper
Proceedings Volume 10143, 1014321 (2017) https://doi.org/10.1117/12.2257923
KEYWORDS: Photomasks, Lithography, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, Bridges, Etching, Dielectrics, Metals, Monte Carlo methods

Proceedings Article | 24 March 2017 Presentation + Paper
Proceedings Volume 10143, 101430I (2017) https://doi.org/10.1117/12.2259964
KEYWORDS: Extreme ultraviolet lithography, Optical lithography, 3D modeling, Data modeling, Resistance, Photomasks, Calibration, Stochastic processes, Semiconducting wafers

Showing 5 of 45 publications
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