Dr. Christiane Jehoul
Process Engineer at imec
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 5 October 2023 Paper
Oktay Yildirim, Richard van Haren, Orion Mouraille, Ilirjan Aliaj, Jan Hermans, Christiane Jehoul
Proceedings Volume 12802, 128020Q (2023) https://doi.org/10.1117/12.2675473
KEYWORDS: Etching, Semiconducting wafers, Overlay metrology, Plasma, Chemistry, Reticles, Polymers, Ions, Discontinuities, Polymerization

Proceedings Article | 27 April 2023 Presentation + Paper
Proceedings Volume 12496, 124960I (2023) https://doi.org/10.1117/12.2658084
KEYWORDS: Ruthenium, Optical alignment, Semiconducting wafers, Overlay metrology, Oxides, Silicon, Metals, Etching, Scanners, Copper

Proceedings Article | 26 May 2022 Presentation + Paper
Gian Francesco Lorusso, Christophe Beral, Janusz Bogdanowicz, Danilo De Simone, Mahmudul Hasan, Christiane Jehoul, Alain Moussa, Mohamed Saib, Mohamed Zidan, Joren Severi, Vincent Truffert, Dieter Van den Heuvel, Alex Goldenshtein, Kevin Houchens, Gaetano Santoro, Daniel Fischer, Angelika Muellender, Joey Hung, Roy Koret, Igor Turovets, Kit Ausschnitt, Chris Mack, Tsuyoshi Kondo, Tomoyasu Shohjoh, Masami Ikota, Anne-Laure Charley, Philippe Leray
Proceedings Volume 12053, 120530O (2022) https://doi.org/10.1117/12.2614046
KEYWORDS: Fourier transforms, Signal to noise ratio, Metrology, Line width roughness, Scanning electron microscopy, Semiconducting wafers, Atomic force microscopy, Scatterometry, Extreme ultraviolet lithography, Image quality

Proceedings Article | 30 March 2017 Paper
Proceedings Volume 10147, 101471C (2017) https://doi.org/10.1117/12.2259750
KEYWORDS: Far infrared, Optical alignment, Semiconducting wafers, Sensors, Signal detection, Avalanche photodetectors, Signal processing, Scanners, Optical lithography, Overlay metrology

Proceedings Article | 28 March 2017 Paper
Proceedings Volume 10145, 101451J (2017) https://doi.org/10.1117/12.2257848
KEYWORDS: Silica, Overlay metrology, Scanning electron microscopy, Semiconductors, Semiconductor manufacturing, Manufacturing, Photomasks, Semiconducting wafers, Lithography, Scanners, Optical lithography, Sensors

Proceedings Article | 24 March 2017 Paper
Michael Kubis, Rich Wise, Charlotte Chahine, Katja Viatkina, Samee Ur-Rehman, Geert Simons, Mircea Dusa, David Hellin, Daniel Sobieski, Wenzhe Zhang, Christiane Jehoul, Patrick Jaenen, Philippe Leray
Proceedings Volume 10147, 101470H (2017) https://doi.org/10.1117/12.2260000
KEYWORDS: Etching, Scanners, Semiconducting wafers, Optical lithography, Overlay metrology, Lithography, Immersion lithography, Metrology, Atomic force microscopy, Ions, Critical dimension metrology

Proceedings Article | 24 March 2016 Paper
Proceedings Volume 9778, 97782M (2016) https://doi.org/10.1117/12.2219491
KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Scanners, Etching, Avalanche photodetectors, Optical lithography, Silicon, Metrology, Chemical mechanical planarization

Proceedings Article | 19 March 2015 Paper
Proceedings Volume 9424, 942408 (2015) https://doi.org/10.1117/12.2087116
KEYWORDS: Overlay metrology, Optical lithography, Etching, Scanning electron microscopy, Semiconducting wafers, Back end of line, Tin, Logic, Scanners, Diffraction

Proceedings Article | 28 July 2014 Paper
Proceedings Volume 9256, 92560L (2014) https://doi.org/10.1117/12.2070045
KEYWORDS: Photomasks, Extreme ultraviolet, Reticles, Semiconducting wafers, Particles, Inspection, Extreme ultraviolet lithography, Bismuth, Printing, Scanners

Proceedings Article | 20 April 2011 Paper
Ofir Montal, Ido Dolev, Moshe Rosenzweig, Kfir Dotan, Doron Meshulach, Ofer Adan, Shimon Levi, Man-Ping Cai, Chris Bencher, Chris Ngai, Christiane Jehoul, Dieter Van Den Heuvel, Eric Hendrickx
Proceedings Volume 7971, 79710G (2011) https://doi.org/10.1117/12.881323
KEYWORDS: Extreme ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Bridges, Inspection, Scattering, Polarization, Photoresist processing, Light scattering, Neodymium

Proceedings Article | 8 April 2011 Paper
Proceedings Volume 7969, 796937 (2011) https://doi.org/10.1117/12.879406
KEYWORDS: Photoresist processing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Etching, Standards development, Manufacturing, Particles, Critical dimension metrology

Proceedings Article | 2 April 2010 Paper
Gaetano Santoro, Dieter Van den Heuvel, Jennifer Braggin, Craig Rosslee, Philippe Leray, Shaunee Cheng, Christiane Jehoul, Robert Schreutelkamp, Noam Hillel
Proceedings Volume 7638, 763820 (2010) https://doi.org/10.1117/12.846969
KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Particles, Extreme ultraviolet lithography, Image processing, Lithography, Immersion lithography, Photomasks, Extreme ultraviolet, Chromium

Proceedings Article | 23 March 2010 Paper
Proceedings Volume 7636, 76361L (2010) https://doi.org/10.1117/12.848210
KEYWORDS: Semiconducting wafers, Reticles, Critical dimension metrology, Extreme ultraviolet, Silicon, Lithography, Extreme ultraviolet lithography, Overlay metrology, Photoresist processing, Scanners

Showing 5 of 13 publications
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