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Dr. Irina Lyulina
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Publications (3)
Proceedings Article | 20 March 2019 Paper
Holistic feedforward control for the 5 nm logic node and beyond
Henry Megens, Ralph Brinkhof, Igor Aarts, Haico Kok, Leendertjan Karssemeijer, Gijs ten Haaf, Shawn Lee, Daan Slotboom, Chris de Ruiter, Irina Lyulina, Simon Huisman, Stefan Keij, Evert Mos, Wim Tel, Manouk Rijpstra, Emil Schmitt-Weaver, Kaustuve Bhattacharyya, Robert Socha, Boris Menchtchikov, Michael Kubis, Jan Mulkens
Proceedings Volume 10961, 109610K (2019) https://doi.org/10.1117/12.2515449
KEYWORDS: Lithographic process control, Semiconducting wafers, Optical alignment, Overlay metrology, Sensors, Distortion, Scanners, Logic, Metrology, Process control
Proceedings Article | 20 March 2018 Paper
Reduction in overlay error from mark asymmetry using simulation, ORION, and alignment models
Boris Menchtchikov, Robert Socha, Chumeng Zheng, Sudhar Raghunathan, Igor Aarts, Krishanu Shome, Jonathan Lee, Chris de Ruiter, Manouk Rijpstra, Henry Megens, Ralph Brinkhof, Floris Teeuwisse, Leendertjan Karssemeijer, Irina Lyulina, Chung-Tien Li, Jan Hermans, Philippe Leray
Proceedings Volume 10587, 105870C (2018) https://doi.org/10.1117/12.2297493
KEYWORDS: Optical alignment, Monte Carlo methods, Overlay metrology, Polarization, Sensors, Chemical mechanical planarization, Etching, Scanners
Proceedings Article | 30 March 2017 Paper
Computational scanner wafer mark alignment
Proceedings Volume 10147, 101471C (2017) https://doi.org/10.1117/12.2259750
KEYWORDS: Far infrared, Optical alignment, Semiconducting wafers, Sensors, Signal detection, Avalanche photodetectors, Signal processing, Scanners, Optical lithography, Overlay metrology
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