Dr. Ru-Gun Liu
SPIE Involvement:
Author
Publications (27)

Proceedings Article | 12 November 2024 Presentation + Paper
Proceedings Volume 13216, 1321604 (2024) https://doi.org/10.1117/12.3047176
KEYWORDS: Metals, Optical lithography, Logic, Semiconducting wafers, Extreme ultraviolet lithography, Etching, Scanning electron microscopy, Lithography, Tin

Proceedings Article | 19 March 2018 Paper
Proceedings Volume 10584, 105841E (2018) https://doi.org/10.1117/12.2302685
KEYWORDS: Photomasks, Vestigial sideband modulation, Monte Carlo methods, Model-based design, Beam shaping, Critical dimension metrology, Electron beam lithography, Lithography, Process modeling, Optical lithography

Proceedings Article | 15 March 2016 Paper
Proceedings Volume 9780, 97801R (2016) https://doi.org/10.1117/12.2225127
KEYWORDS: Diffraction, Photomasks, Polarizers, Dielectric polarization, Image quality, Polarization, Transmittance, Immersion lithography, Lithography, Diffraction gratings

Proceedings Article | 19 March 2015 Paper
Chih-Shiang Chou, Hsu-Ting Huang, Fu-Sheng Chu, Yuan-Chih Chu, Wen-Chun Huang, Ru-Gun Liu, Tsai-Sheng Gau
Proceedings Volume 9424, 94241A (2015) https://doi.org/10.1117/12.2085113
KEYWORDS: Photomasks, 3D modeling, Inspection, Diffraction, 3D metrology, Semiconducting wafers, 3D image processing, Calibration, Scattering, Wafer inspection

Proceedings Article | 31 March 2014 Paper
Proceedings Volume 9052, 90520Y (2014) https://doi.org/10.1117/12.2045538
KEYWORDS: 3D modeling, Scanning electron microscopy, Diffusion, Data modeling, Lithography, Calibration, Semiconducting wafers, Visual process modeling, 3D image processing, Optical proximity correction

Proceedings Article | 12 April 2013 Paper
Shuo-Yen Chou, Hoi-Tou Ng, Yi-Yin Chen, Chien-Fu Lee, Ru-Gun Liu, Tsai-Sheng Gau
Proceedings Volume 8683, 868315 (2013) https://doi.org/10.1117/12.2010599
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Diffraction, Reflectivity, Polarization, Spectrum analysis, Control systems, Critical dimension metrology, Resolution enhancement technologies

Proceedings Article | 10 April 2013 Paper
C. S. Chou, Y. Y. He, Y. P. Tang, Y. T. Chang, W. C. Huang, R. G. Liu, T. S. Gau
Proceedings Volume 8681, 868113 (2013) https://doi.org/10.1117/12.2010846
KEYWORDS: 3D modeling, Scanning electron microscopy, Photoresist materials, Diffusion, Calibration, Critical dimension metrology, Performance modeling, 3D image processing, Optical proximity correction, Lithography

Proceedings Article | 14 March 2012 Paper
C. S. Chou, Y. P. Tang, F. S. Chu, W. C. Huang, R. G. Liu, T. S. Gau
Proceedings Volume 8326, 83261L (2012) https://doi.org/10.1117/12.917794
KEYWORDS: Photomasks, Semiconducting wafers, Reticles, 3D image reconstruction, Photoresist materials, Scanning electron microscopy, Reflection, Calibration, Refraction, 3D acquisition

Proceedings Article | 13 March 2012 Paper
Proceedings Volume 8326, 832619 (2012) https://doi.org/10.1117/12.917402
KEYWORDS: Printing, Optical proximity correction, Atrial fibrillation, Calibration, Semiconducting wafers, Data modeling, 3D modeling, SRAF, Scanning electron microscopy, Cadmium

Proceedings Article | 16 March 2009 Paper
Y. P. Tang, J. H. Feng, M. H. Chih, C. K. Tsai, W. C. Huang, C. C. Kuo, R. G. Liu, H. T. Lin, Y. C. Ku
Proceedings Volume 7274, 72742G (2009) https://doi.org/10.1117/12.814907
KEYWORDS: Optical proximity correction, Image segmentation, Optical lithography, Resolution enhancement technologies, Lithographic illumination, Detection and tracking algorithms, Neodymium, Semiconductor manufacturing, Immersion lithography, Photomasks

Proceedings Article | 19 March 2008 Paper
Proceedings Volume 6925, 69251R (2008) https://doi.org/10.1117/12.775420
KEYWORDS: Lithography, Design for manufacturing, Nanoimprint lithography, Optical lithography, Manufacturing, Design for manufacturability, Critical dimension metrology, Model-based design, Semiconducting wafers, Inspection

Proceedings Article | 7 March 2008 Paper
Boren Luo, Chi-Kang Chang, W. Wang, W. Huang, Timothy Wu, C. Lai, R. Liu, H. Lin, K. Chen, Y. Ku
Proceedings Volume 6924, 69243T (2008) https://doi.org/10.1117/12.775419
KEYWORDS: Pellicles, Optical proximity correction, Photomasks, Data modeling, Polarization, Immersion lithography, Projection systems, Diffraction, Signal attenuation, Critical dimension metrology

Proceedings Article | 21 March 2007 Paper
Y. C. Cheng, T. H. Ou, M. H. Wu, W. L. Wang, J. H. Feng, W. C. Huang, C. M. Lai, R. G. Liu, Y. C. Ku
Proceedings Volume 6521, 65210G (2007) https://doi.org/10.1117/12.717254
KEYWORDS: Optical lithography, Instrument modeling, Data modeling, Critical dimension metrology, Transistors, Field effect transistors, Manufacturing, Design for manufacturing, Silicon, Lithography

Proceedings Article | 20 March 2006 Paper
W.C. Huang, C.M. Lai, B. Luo, C.K. Tsai, M.H. Chih, C.W. Lai, C.C. Kuo, R.G. Liu, H.T. Lin
Proceedings Volume 6154, 615436 (2006) https://doi.org/10.1117/12.657792
KEYWORDS: Optical proximity correction, Lithography, Genetic algorithms, Model-based design, Optimization (mathematics), Artificial neural networks, Image segmentation, Neural networks, Semiconducting wafers, Systems modeling

Proceedings Article | 12 May 2005 Paper
W. Huang, C. Lai, B. Luo, C. Tsai, C. Tsay, C. Kuo, R. Liu, H. Lin, B. Lin
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602096
KEYWORDS: Optical proximity correction, Lithography, Wafer-level optics, Genetic algorithms, Model-based design, Data modeling, Optimization (mathematics), Optical lithography, Photomasks, Semiconducting wafers

Proceedings Article | 28 May 2004 Paper
Chih-Ming Lai, Jeng-Shiun Ho, Chien-Wen Lai, Cheng-Kun Tsai, Cherng-Shyan Tsay, Jeng-Horng Chen, Ru-Gun Liu, Yao Ku, Burn-Jeng Lin
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.544250
KEYWORDS: Optical proximity correction, Optical lithography, Algorithm development, Lithography, Photomasks, Critical dimension metrology

Proceedings Article | 28 May 2004 Paper
Wen-Chun Huang, Chia-Hui Lin, Chin-Chen Kuo, C. Huang, J. Lin, Jeng-Horng Chen, Ru-Gun Liu, Yao Ku, Burn-Jeng Lin
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.544252
KEYWORDS: Optical proximity correction, Data modeling, Optical lithography, Photoresist processing, Chemical reactions

SPIE Journal Paper | 1 April 2004
JM3, Vol. 3, Issue 02, (April 2004) https://doi.org/10.1117/12.10.1117/1.1669508
KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Tolerancing, Error analysis, Scanners, Diffraction, Solids, Lithography, Electroluminescence

Proceedings Article | 17 December 2003 Paper
Shih-Ming Chang, Chih-Cheng Chin, Wen-Chuan Wang, Chi-Lun Lu, Ren-Guey Hsieh, Cherng-Shyan Tsay, Yung-Sung Yen, Sheng-Chi Chin, Hsin-Chang Lee, Ru-Gun Liu, Kuei-Shun Chen, Hung-Chang Hsieh, Yao Ku, John Lin
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518008
KEYWORDS: Photomasks, Error analysis, Critical dimension metrology, Lithography, Manufacturing, Inspection, Etching, Software development, Semiconductor manufacturing, Control systems

Proceedings Article | 28 August 2003 Paper
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504288
KEYWORDS: Photomasks, Optical proximity correction, Inspection, Semiconducting wafers, Defect inspection, Lithography, Critical dimension metrology, Mask making, Manufacturing, Vestigial sideband modulation

Proceedings Article | 26 June 2003 Paper
Tzy-Kuang Lee, Yao-Ching Wang, Min-hwa Chi, C. Lu, C. Hsieh, R. Liu, H. Liao, S. Yang, Chih-Hao Chang
Proceedings Volume 5042, (2003) https://doi.org/10.1117/12.485250
KEYWORDS: Optical proximity correction, Transistors, Critical dimension metrology, Etching, CMOS technology, Photomasks, Amplifiers, Optical lithography, Semiconducting wafers, Silicon

SPIE Journal Paper | 1 October 2002
JM3, Vol. 1, Issue 03, (October 2002) https://doi.org/10.1117/12.10.1117/1.1502261
KEYWORDS: Diffraction, Printing, Photomasks, Phase shifts, Lithographic illumination, Visualization, Monochromatic aberrations, Lithography, Optical lithography, Resolution enhancement technologies

Proceedings Article | 30 July 2002 Paper
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474511
KEYWORDS: Optical proximity correction, Critical dimension metrology, Photomasks, Model-based design, Semiconducting wafers, Cadmium, Data modeling, Logic, Lithography, Phase shifts

Proceedings Article | 30 July 2002 Paper
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474574
KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Mask making, Lithography, Tolerancing, Scanners, Optical lithography, Error analysis, Semiconductor manufacturing

Proceedings Article | 14 September 2001 Paper
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435683
KEYWORDS: Antimony, Scattering, Critical dimension metrology, Double sideband modulation, Resolution enhancement technologies, Modulation, Superposition, Light scattering, Chromium, Photoresist processing

Proceedings Article | 5 July 2000 Paper
Tsai-Sheng Gau, Ru-Gun Liu, Chun-Kuang Chen, Chih-Ming Lai, Fu-Jye Liang, Chin Hsia
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389016
KEYWORDS: Optical proximity correction, Diffraction, Printing, Optical lithography, Electroluminescence, Lithographic illumination, Resolution enhancement technologies, Photomasks, Scanning electron microscopy, Diffractive optical elements

Proceedings Article | 26 July 1999 Paper
Chin Hsia, Tsai-Sheng Gau, Chuen-Huei Yang, Ru-Gun Liu, ChungHsing Chang, Li-Jui Chen, Chien-Ming Wang, J. Fung Chen, Bruce Smith, Gue-Wuu Hwang, JiannWen Lay, Dong-Yuan Goang
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354354
KEYWORDS: Optical proximity correction, Lithographic illumination, Optical filters, Resolution enhancement technologies, Electroluminescence, Lithography, Optical lithography, Photomasks, Modulation, Calcium

Showing 5 of 27 publications
Conference Committee Involvement (12)
Advanced Etch Technology and Process Integration for Nanopatterning XII
28 February 2023 | San Jose, California, United States
Advanced Etch Technology and Process Integration for Nanopatterning XI
26 April 2022 | San Jose, California, United States
Advanced Etch Technology and Process Integration for Nanopatterning X
22 February 2021 | Online Only, California, United States
Design-Process-Technology Co-optimization for Manufacturability XIV
26 February 2020 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning IX
25 February 2020 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XIII
27 February 2019 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning VIII
25 February 2019 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XII
28 February 2018 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning VII
26 February 2018 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XI
1 March 2017 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability X
24 February 2016 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability IX
25 February 2015 | San Jose, California, United States
Showing 5 of 12 Conference Committees
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