Dr. Ken Fu Chang Profile

Dr. Ken Fu Chang

at ASML Netherland BV

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Author

Publications (4)

Proceedings Article | 22 February 2021 Presentation + Paper

Characterization of metrology to device overlay offset and novel methods to minimize it

Kaustuve Bhattacharyya, Ken Chang, Jeff Lin, Simon Mathijssen, Marc Noot, Farzad Farhadzadeh, Arie Den Boef, Momo Lin, Frank Sun, Justin Huang, Sax Liao, Edison Wang, Jason Hung, Benny Gosali, Wilson Liu, Cathy Wang, Matthew Mclaren

Proceedings Volume 11611, 116110C (2021) https://doi.org/10.1117/12.2583861

KEYWORDS: Overlay metrology, Metrology, Etching, Data modeling, Model-based design, Measurement devices, Lithography

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Proceedings Article | 26 March 2019 Presentation + Paper

Color mixing in overlay metrology for greater accuracy and robustness

Simon Mathijssen, Marc Noot, Murat Bozkurt, Narjes Javaheri, Reza Hajiahmadi, Antonios Zagaris, Ken Chang, Benny Gosali, Eason Su, Cathy Wang, Arie den Boef, Kaustuve Bhattacharyya, Guo-Tsai Huang, Kai-Hsiung Chen, John Lin

Proceedings Volume 10959, 109591G (2019) https://doi.org/10.1117/12.2514949

KEYWORDS: Overlay metrology, Semiconducting wafers, Diffraction gratings, Scanning electron microscopy, Diffraction, Etching, Target detection, Sensors, Metrology, Switching

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Proceedings Article | 13 March 2018 Presentation + Paper

Multi-wavelength approach towards on-product overlay accuracy and robustness

Kaustuve Bhattacharyya, Marc Noot, Hammer Chang, Sax Liao, Ken Chang, Benny Gosali, Eason Su, Cathy Wang, Arie den Boef, Christophe Fouquet, Guo-Tsai Huang, Kai-Hsiung Chen, Kevin Cheng, John Lin

Proceedings Volume 10585, 105851F (2018) https://doi.org/10.1117/12.2297420

KEYWORDS: Overlay metrology, Semiconducting wafers, Etching, Polarization, Metrology, Scanning electron microscopy, Physics, Signal processing, Monte Carlo methods, Semiconductor manufacturing

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Proceedings Article | 28 March 2017 Presentation + Paper

A complete methodology towards accuracy and lot-to-lot robustness in on-product overlay metrology using flexible wavelength selection

Kaustuve Bhattacharyya, Arie den Boef, Marc Noot, Omer Adam, Grzegorz Grzela, Andreas Fuchs, Martin Jak, Sax Liao, Ken Chang, Vincent Couraudon, Eason Su, Wilson Tzeng, Cathy Wang, Christophe Fouquet, Guo-Tsai Huang, Kai-Hsiung Chen, Y. C. Wang, Kevin Cheng, Chih-Ming Ke, L. G. Terng

Proceedings Volume 10145, 101450A (2017) https://doi.org/10.1117/12.2257662

KEYWORDS: Overlay metrology, Polarization, Semiconducting wafers, Defense systems, Process control, Wafer-level optics, Diffraction gratings, Solids, Metrology, Image quality, Target detection, Detection and tracking algorithms, Diffraction, Thin films

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