Mr. Matt Hettermann Profile

Matt Hettermann

VP of R&D at EUV Tech

SPIE Involvement:

Author

Area of Expertise:

Metrology , Systems Engineering , R&D

Websites:

Company Website

Publications (11)

Proceedings Article | 13 November 2024 Presentation

Metrology-class EUV light source based on broadband emission from copper-target laser produced plasma

Seth Cousin, Feng Dong, Stuart Sherwin, Matt Hettermann, Dave Houser, Patrick Naulleau

Proceedings Volume 13216, 132160X (2024) https://doi.org/10.1117/12.3035515

KEYWORDS: Extreme ultraviolet, Plasma, Metrology, Light sources, Copper, Pulsed laser operation, Scatterometry, Reflectometry, Laser systems engineering, Engineering

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Proceedings Article | 13 November 2024 Presentation

Sub-angstrom critical dimension metrology with EUV scatterometry

Stuart Sherwin, Matt Hettermann, Dave Houser, Luke Long, Patrick Naulleau

Proceedings Volume 13216, 132160V (2024) https://doi.org/10.1117/12.3035715

KEYWORDS: Critical dimension metrology, Extreme ultraviolet, Scatterometry, Photomasks, Scanning electron microscopy, SRAF, Metrology, Simulations, Resolution enhancement technologies, Process control

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SPIE Journal Paper | 8 November 2024

Understanding and measuring EUV mask 3D effects

Stuart Sherwin, Matt Hettermann, Dave Houser, Patrick Naulleau

JM3, Vol. 23, Issue 04, 041407, (November 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.4.041407

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SPIE Journal Paper | 19 September 2024

Effects of extreme ultraviolet multilayer roughness on 2D patterning

Luke Long, Stuart Sherwin, Ryan Miyakawa, Tom Pistor, Matt Hettermann, Patrick Naulleau

JM3, Vol. 23, Issue 03, 034401, (September 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.3.034401

KEYWORDS: Optical lithography, Extreme ultraviolet, Ruthenium, Tantalum, Critical dimension metrology, Simulations, Near field, Imaging systems, Data modeling, Semiconducting wafers

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Proceedings Article | 10 April 2024 Poster + Paper

Metrology-class EUV light source based on quasi-continuous copper LPP

Seth Cousin, Feng Dong, Matt Hettermann, Dave Houser, Patrick Naulleau

Proceedings Volume 12953, 129531D (2024) https://doi.org/10.1117/12.3012186

KEYWORDS: Extreme ultraviolet, Metrology, Copper, Extreme ultraviolet lithography, Reflectometry, Light sources, Laser systems engineering, Plasma, Laser metrology, High volume manufacturing

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Proceedings Article | 10 April 2024 Presentation + Paper

Understanding and measuring EUV mask 3D effects

Stuart Sherwin, Matt Hettermann, Dave Houser, Patrick Naulleau

Proceedings Volume 12953, 129530F (2024) https://doi.org/10.1117/12.3012400

KEYWORDS: Extreme ultraviolet, Phase shifts, Multilayers, Light sources and illumination, Extreme ultraviolet lithography, Reflection, Ruthenium, 3D mask effects, Tantalum, Scanners

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Proceedings Article | 10 April 2024 Presentation

Effects of EUV multilayer roughness on 2D patterning

Luke Long, Stuart Sherwin, Ryan Miyakawa, Tom Pistor, Matt Hettermann, Patrick Naulleau

Proceedings Volume PC12953, PC129530J (2024) https://doi.org/10.1117/12.3012360

KEYWORDS: Optical lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Phase shifts, Semiconducting wafers, Printing, Panoramic photography, Monte Carlo methods, Lithography, Attenuation

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Proceedings Article | 22 November 2023 Presentation

EUV actinic scatterometry for in-pattern phase metrology

Stuart Sherwin, Matt Hettermann, Dave Houser, Chami Perera, Patrick Naulleau

Proceedings Volume PC12751, PC127510P (2023) https://doi.org/10.1117/12.2688099

KEYWORDS: Phase shifts, Extreme ultraviolet, Metrology, Scatterometry, Phase measurement, Near field, Light scattering, Laser scattering, Attenuation, 3D mask effects

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Proceedings Article | 21 November 2023 Presentation + Paper

Development of EUV phase shift mask metrology

Elba Gomar-Nadal, Malahat Tavassoli, Kowtilya Bijjula, Stuart Sherwin, Matt Hettermann, Christian Wilson, Feng Dong, Dave Houser, Alexander Khodarev, Chami Perera, Patrick Naulleau

Proceedings Volume 12751, 127510O (2023) https://doi.org/10.1117/12.2688453

KEYWORDS: Phase shifts, Extreme ultraviolet, Metrology, Reflectance spectroscopy, Reflectometry, Spectroscopy, Signal attenuation, Refractive index, Phase measurement, Thin films

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Proceedings Article | 26 September 2023 Presentation

Applications of EUV metrology tools

Matt Hettermann

Proceedings Volume PC12915, PC1291502 (2023) https://doi.org/10.1117/12.3012429

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Proceedings Article | 30 April 2023 Presentation

EUV phase monitoring applications with actinic reflectometry

Stuart Sherwin, Eric Gullikson, Matt Hettermann, Dave Houser, Chami Perera, Patrick Naulleau

Proceedings Volume PC12494, PC1249408 (2023) https://doi.org/10.1117/12.2662135

KEYWORDS: Extreme ultraviolet, Reflectometry, Phase measurement, Photomasks, Metrology, Reflectance spectroscopy, Spectroscopy, Scatterometry, Plasma, Phase shifts

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Showing 5 of 11 publications

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