Dr. Mohan Ananth Profile

Dr. Mohan Ananth

Sr. Director, Strategic and Government Programs at Carl Zeiss Microscopy LLC

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 1 June 2011 Paper

Creating nanohole arrays with the helium ion microscope

Mohan Ananth, Lewis Stern, David Ferranti, Chuong Huynh, John Notte, Larry Scipioni, Colin Sanford, Bill Thompson

Proceedings Volume 8036, 80360M (2011) https://doi.org/10.1117/12.887497

KEYWORDS: Helium, Gallium, Gold, Ions, Ion beams, Chemical species, Scanning helium ion microscopy, Scanning electron microscopy, Sputter deposition, Image resolution

Read Abstract +

Proceedings Article | 22 January 2001 Paper

Investigating inspectability and printability of contamination deposited during SEM analysis

Bryan Kasprowicz, Mohan Ananth, Chih-Yu Wang

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410674

KEYWORDS: Reticles, Photomasks, Contamination, Scanning electron microscopy, Inspection, Molecules, Binary data, Semiconducting wafers, Carbon, Quartz

Read Abstract +

Proceedings Article | 25 August 1999 Paper

Reticle OPC defect printability and detectability for 180-nm technology

Maciej Rudzinski, Larry Zurbrick, Donald Pettibone, Mohan Ananth

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360249

KEYWORDS: Semiconducting wafers, Reticles, Optical proximity correction, Inspection, Defect detection, Critical dimension metrology, Scanning electron microscopy, Photomasks, Deep ultraviolet, Databases

Read Abstract +

Proceedings Article | 14 June 1999 Paper

Wafer printability simulation accuracy based on UV optical inspection images of reticle defects

Donald Pettibone, Mohan Ananth, Maciej Rudzinski, Sterling Watson, Larry Zurbrick, Hua-Yu Liu, Linard Karklin

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350857

KEYWORDS: Reticles, Semiconducting wafers, Scanning electron microscopy, Optical inspection, Cadmium sulfide, Photomasks, Wafer-level optics, Inspection, 3D modeling, Manufacturing

Read Abstract +

Proceedings Article | 12 February 1997 Paper

Initial characterization results of a low-voltage CD SEM for reticle metrology

Rich Quattrini, Craig MacNaughton, Richard Elliott, Waiman Ng, Rohit Malhotra, Mohan Ananth, Jason Yee

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301185

KEYWORDS: Scanning electron microscopy, Photomasks, Metrology, Critical dimension metrology, Semiconducting wafers, Reticles, Quartz, Silicon, Photoresist materials, Glasses

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years