Dr. Ping Qu Profile

Dr. Ping Qu

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Publications (4)

Proceedings Article | 29 May 2007 Paper

Progress on EUV mask fabrication for 32-nm technology node and beyond

Guojing Zhang, Pei-Yang Yan, Ted Liang, Seh-jin Park, Peter Sanchez, Emily Shu, Erdem Ultanir, Sven Henrichs, Alan Stivers, Gilroy Vandentop, Barry Lieberman, Ping Qu

Proceedings Volume 6607, 66070R (2007) https://doi.org/10.1117/12.728941

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Inspection, Extreme ultraviolet, Multilayers, Reflectivity, Etching, Mask making, Metrology, Defect inspection

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Proceedings Article | 15 March 2006 Paper

Alt- phase-shift mask technology for 65nm logic applications

Kishore Chakravorty, Sven Henrichs, Wei Qiu, Joas Chavez, Yi-Ping Liu, Firoz Ghadiali, Karmen Yung, Nathan Wilcox, Mary Silva, Jian Ma, Ping Qu, Brian Irvine, Henry Yun, Wen-Hao Cheng, Jeff Farnsworth

Proceedings Volume 6154, 61540M (2006) https://doi.org/10.1117/12.654691

KEYWORDS: Quartz, Photomasks, Manufacturing, Etching, Optical lithography, Logic, Critical dimension metrology, Phase shifts, Optical proximity correction, Reticles

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Proceedings Article | 28 June 2005 Paper

Second level exposure for phase shift mask applications using an SLM-based DUV mask writer

Mahesh Chandramouli, Bob Olshausen, Yulia Korobko, Sven Henrichs, Ping Qu, Jian Ma, Bruce Auches, Damon Cole, Thomas Ostrom, Angela Beyerl, Robert Eklund, Raoul Zerne, Peter Goransson, Magnus Persson, Tom Newman

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617359

KEYWORDS: Neodymium, Photomasks, Spatial light modulators, Deep ultraviolet, Electron beam lithography, Optical alignment, Quartz, Optical lithography, Chromium, Critical dimension metrology

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Proceedings Article | 6 December 2004 Paper

EUVL mask patterning with blanks from commercial suppliers

Pei-Yang Yan, Guojing Zhang, Rajesh Nagpal, Emily Shu, Chaoyang Li, Ping Qu, Frederick Chen

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569329

KEYWORDS: Extreme ultraviolet lithography, Reflectivity, Photomasks, Optical lithography, Ruthenium, Etching, Inspection, Chromium, Coating, Scanning electron microscopy

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