Dr. Roger T. Bonnecaze Profile

Dr. Roger T. Bonnecaze

at SandBox Semiconductor

SPIE Involvement:

Author

Publications (21)

Proceedings Article | 26 May 2022 Poster + Paper

Automated extraction of critical dimension from SEM with Weave

Yang Ban, Bryan Sundahl, Jawad Ahmed, Crystal Barrera, S.V. Sreenivasan, Roger Bonnecaze, Meghali Chopra

Proceedings Volume 12053, 1205327 (2022) https://doi.org/10.1117/12.2614282

KEYWORDS: Scanning electron microscopy, Image segmentation, Artificial intelligence, Image processing, Process engineering, Image analysis, Wet etching, Semiconductors, Neural networks, Metals

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Proceedings Article | 25 May 2022 Poster + Paper

Creating new multistep etch and deposition processes with recycled etch data using SandBox Studio AI

Kara Kearney, Leandro Medina, Roger Bonnecaze, Meghali Chopra

Proceedings Volume 12056, 120560E (2022) https://doi.org/10.1117/12.2614301

KEYWORDS: Etching, Calibration, Data modeling, Surface roughness, Process modeling, Photomasks, Extreme ultraviolet, Artificial intelligence, Deposition processes, Optimization (mathematics)

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Proceedings Article | 25 May 2022 Presentation + Paper

Automated, high throughput optimization of multistep and cyclic etch and deposition processes using SandBox Studio AI

Kara Kearney, Leandro Medina, Roger Bonnecaze, Meghali Chopra

Proceedings Volume 12056, 1205608 (2022) https://doi.org/10.1117/12.2614284

KEYWORDS: Etching, Calibration, Artificial intelligence, Data modeling, Deposition processes, Physics, Machine learning, Optimization (mathematics), Semiconductors, Tolerancing

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Proceedings Article | 22 February 2021 Presentation + Paper

Fast etch recipe creation with automated model-based process optimization

Yang Ban, Kara Kearney, Bryan Sundahl, Leandro Medina, Roger Bonnecaze, Meghali Chopra

Proceedings Volume 11615, 116150L (2021) https://doi.org/10.1117/12.2583868

KEYWORDS: Process modeling, Etching, Optimization (mathematics), Model-based design, 3D modeling, Calibration, Statistical modeling, Statistical analysis, Space mirrors, Process engineering

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

Automated extraction of critical dimension from SEM images with WeaveTM

Leandro Medina, Bryan Sundahl, Roger Bonnecaze, Meghali Chopra

Proceedings Volume 11611, 1161135 (2021) https://doi.org/10.1117/12.2583900

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Proceedings Article | 25 March 2020 Paper

Accelerated optimization of multilayer trench etches using model-based experimental design

Kara Kearney, Sonali Chopra, Xilan Zhu, Yang Ban, Roger Bonnecaze, Meghali Chopra

Proceedings Volume 11329, 113290Z (2020) https://doi.org/10.1117/12.2552156

KEYWORDS: Etching, System on a chip, Silicon, Calibration, Model-based design, Argon, Optimization (mathematics), Critical dimension metrology, Semiconductors, Plasma etching

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Proceedings Article | 23 March 2020 Presentation + Paper

Optimal etch recipe prediction for 3D NAND structures

Leandro Medina, Bryan Sundahl, Meghali Chopra, Roger Bonnecaze

Proceedings Volume 11329, 113290C (2020) https://doi.org/10.1117/12.2552121

KEYWORDS: Etching, Calibration, 3D modeling, Process modeling, Solid modeling, Silicon, Model-based design, Data modeling, 3D acquisition, Visual process modeling

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Proceedings Article | 20 March 2019 Presentation + Paper

Predicting and optimizing etch recipes for across the wafer uniformity

Meghali Chopra, Roger Bonnecaze, Yang Ban, Sofia Helpert

Proceedings Volume 10963, 1096309 (2019) https://doi.org/10.1117/12.2515097

KEYWORDS: Semiconducting wafers, Etching, Neural networks, Calibration, Process modeling, Cadmium sulfide, Critical dimension metrology, Plasma, Plasma etching, Data modeling

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Proceedings Article | 20 March 2019 Presentation + Paper

Simulation and optimization of etch on flexible substrates for roll-to-roll processing

Sofia Helpert, Yang Ban, Meghali Chopra, Roger Bonnecaze

Proceedings Volume 10963, 109630T (2019) https://doi.org/10.1117/12.2515104

KEYWORDS: Etching, Calibration, Plasma etching, Amorphous silicon, Plasma, Manufacturing, Reactive ion etching, Analytics, Data modeling

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Proceedings Article | 20 March 2018 Presentation + Paper

Minimum reaction network necessary to describe Ar/CF4 plasma etch

Sofia Helpert, Meghali Chopra, Roger Bonnecaze

Proceedings Volume 10589, 105890J (2018) https://doi.org/10.1117/12.2297502

KEYWORDS: Plasma, Autoregressive models, Plasma etching, Databases, Argon, Etching, Data modeling, Plasma systems, Temperature metrology, Particles

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Proceedings Article | 20 March 2018 Presentation + Paper

A model-based, Bayesian approach to the CF4/Ar etch of SiO2

Meghali Chopra, Sofia Helpert, Rahul Verma, Zizhuo Zhang, Xilan Zhu, Roger Bonnecaze

Proceedings Volume 10588, 105880G (2018) https://doi.org/10.1117/12.2297482

KEYWORDS: Etching, Plasma, Autoregressive models, Systems modeling, Calibration, Argon, Data modeling, Ions, Model-based design, Chemistry

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Proceedings Article | 20 March 2018 Presentation + Paper

A cellular automata simulation of atomic layer etching

Jan Strotmann, Meghali Chopra, Roger Bonnecaze

Proceedings Volume 10589, 105890H (2018) https://doi.org/10.1117/12.2297435

KEYWORDS: Etching, Chemical species, Focus stacking software, Silicon, Argon, Chlorine, Plasma, Ions, Surface roughness

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Proceedings Article | 21 March 2017 Paper

A method to accelerate creation of plasma etch recipes using physics and Bayesian statistics

Meghali Chopra, Rahul Verma, Austin Lane, C. Willson, Roger Bonnecaze

Proceedings Volume 10149, 101490X (2017) https://doi.org/10.1117/12.2263507

KEYWORDS: Plasma, Plasma etching, Etching, Data modeling, Calibration, Physics, Chemistry, Parallel computing, Semiconducting wafers, Sputter deposition, Diffractive optical elements, Anisotropy, Plasma systems, Process engineering, Ions

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Proceedings Article | 16 March 2016 Paper

Rapid recipe formulation for plasma etching of new materials

Meghali Chopra, Zizhuo Zhang, John Ekerdt, Roger Bonnecaze

Proceedings Volume 9781, 978111 (2016) https://doi.org/10.1117/12.2219171

KEYWORDS: Etching, Plasma, Data modeling, Plasma etching, Dry etching, Magnesium, Oxides, Chemistry, Optimization (mathematics), Bayesian inference, Calibration, Ions, Autoregressive models, Electrons, Statistical modeling

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SPIE Journal Paper | 21 October 2015

Impact of polymer curing on two-dimensional and three-dimensional shape change in nanoimprint lithography

Meghali Chopra, Roger Bonnecaze

JM3, Vol. 14, Issue 04, 044502, (October 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.044502

KEYWORDS: Etching, Polymers, Diamond, Nanoimprint lithography, Distortion, Anisotropic etching, Oxides, Image processing, 3D modeling, 3D image processing

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Proceedings Article | 15 April 2015 Paper

Shape change of cured 2D and 3D nanostructures from imprint lithography

Meghali Chopra, Roger Bonnecaze

Proceedings Volume 9423, 94230W (2015) https://doi.org/10.1117/12.2186050

KEYWORDS: Polymers, Nanoimprint lithography, 3D modeling, Nanostructures, Lithography, Ultraviolet radiation, Diamond, Image processing, Manufacturing, Finite element methods

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SPIE Journal Paper | 12 March 2014

Mesoscale modeling: a study of particle generation and line-edge roughness

Siddharth Chauhan, Mark Somervell, Michael Carcasi, Steven Scheer, Roger Bonnecaze, Chris Mack, C. Grant Willson

JM3, Vol. 13, Issue 01, 013012, (March 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.1.013012

KEYWORDS: Particles, Polymers, Line edge roughness, Monte Carlo methods, Diffusion, Photoresist developing, Photoresist materials, Lithography, 3D modeling, Molecules

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Proceedings Article | 26 March 2010 Paper

Particle generation during photoresist dissolution

Siddharth Chauhan, Mark Somervell, Michael Carcasi, Steven Scheer, Roger Bonnecaze, Chris Mack, C. Grant Willson

Proceedings Volume 7639, 763933 (2010) https://doi.org/10.1117/12.848424

KEYWORDS: Particles, Polymers, Monte Carlo methods, Photoresist materials, Photoresist developing, Lithography, Molecules, Diffusion, 3D modeling, Line edge roughness

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Proceedings Article | 1 April 2009 Paper

Polymer dissolution model: an energy adaptation of the critical ionization theory

Siddharth Chauhan, Mark Somervell, Steven Scheer, Chris Mack, Roger Bonnecaze, C. Grant Willson

Proceedings Volume 7273, 727336 (2009) https://doi.org/10.1117/12.814344

KEYWORDS: Polymers, Ionization, Monte Carlo methods, Line edge roughness, Polymer thin films, Interfaces, 3D modeling, Calibration, Molecular interactions, Motion models

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Proceedings Article | 21 March 2006 Paper

Drag-a-drop: a characterization tool for immersion lithography

Derek Bassett, J. Chris Taylor, Will Conley, C. Grant Willson, Roger Bonnecaze

Proceedings Volume 6154, 61544P (2006) https://doi.org/10.1117/12.656482

KEYWORDS: Semiconducting wafers, Microfluidics, Photomasks, Polymers, Glasses, Immersion lithography, Photoresist materials, Dewetting, Reflection, Scanners

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Proceedings Article | 6 May 2005 Paper

Simulation of fluid flow in the step and flash imprint lithography process

Shravanthi Reddy, Roger Bonnecaze

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601413

KEYWORDS: Interfaces, Capillaries, Lithography, Photomasks, Semiconducting wafers, Liquids, Etching, Calcium, Image quality, Image processing

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Showing 5 of 21 publications

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