CONFERENCE PROCEEDINGS
Advanced Search
Xilan Zhu
at SandBox Semiconductor
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 25 March 2020 Paper
Accelerated optimization of multilayer trench etches using model-based experimental design
Proceedings Volume 11329, 113290Z (2020) https://doi.org/10.1117/12.2552156
KEYWORDS: Etching, System on a chip, Silicon, Calibration, Model-based design, Argon, Optimization (mathematics), Critical dimension metrology, Semiconductors, Plasma etching
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top