CONFERENCE PROCEEDINGS
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Ryo Iikubo
at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (2)
Proceedings Article | 12 November 2024 Presentation + Paper
Mask performance improvement by pixel level dose correction
Mayuko Matsumoto, Naoki Yoshida, Tetsunori Hirata, Makoto Motegi, Kiyoshi Kageyama, Mitsuharu Yamana, Wataru Kunishima, Ryo Iikubo
Proceedings Volume 13216, 132160H (2024) https://doi.org/10.1117/12.3034611
KEYWORDS: Error control coding, Critical dimension metrology, Line edge roughness, Design, Semiconducting wafers, Extreme ultraviolet, Optical lithography, Photomasks, Modulation, Electron beam lithography
Proceedings Article | 23 March 2020 Paper
Electron beam mask writer EBM-8000P for high throughput mask production
Tomohiro Iijima, Satoshi Nakahashi, Ryo Iikubo, Takahiro Honbu, Shinsuke Nishimura, Syoji Mori, Hirohiko Honda, Tsuyoshi Yamashita, Tetsurou Nishiyama, Osamu Kawami, Takao Tamura, Kenji Ohtoshi, Hirokazu Yamada
Proceedings Volume 11324, 113241B (2020) https://doi.org/10.1117/12.2552447
KEYWORDS: Photomasks, Electron beams, Critical dimension metrology, Beam shaping
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