Dr. Thomas A. Germer Profile

Dr. Thomas A. Germer

Physicist/Researcher at National Institute of Standards and Technology

SPIE Involvement:

Conference Program Committee | Author | Instructor | Special Event Speaker

Area of Expertise:

Scattering , Diffraction , Polarization , Ellipsometry , Optical Properties

Websites:

Company Website | Personal Website

Publications (61)

Proceedings Article | 21 November 2023 Presentation + Paper

NIST efforts in extreme-ultraviolet metrology

C. Tarrio, S. Grantham, R. Vest, T. Germer, B. Barnes, S. Moffitt, B. Simonds, M. Spidell

Proceedings Volume 12750, 127500F (2023) https://doi.org/10.1117/12.2686832

KEYWORDS: Extreme ultraviolet, Tunable filters, Metrology, Extreme ultraviolet lithography, Radiometry, Scatterometry, Vacuum chambers, Reflectivity, Polarization, Equipment

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Proceedings Article | 15 March 2023 Presentation

Combining Mueller matrix imaging with spatial frequency domain imaging (Conference Presentation)

Thomas Germer, Joseph Chue-Sang

Proceedings Volume PC12382, PC123820F (2023) https://doi.org/10.1117/12.2655702

KEYWORDS: Tissue optics, Spatial frequencies, Optical alignment, Mueller matrices, Biomedical optics

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SPIE Journal Paper | 14 December 2022 Open Access

Spatial frequency domain Mueller matrix imaging

Joseph Chue-Sang, Maritoni Litorja, Aaron Goldfain, Thomas A. Germer

JBO, Vol. 27, Issue 12, 126003, (December 2022) https://doi.org/10.1117/12.10.1117/1.JBO.27.12.126003

KEYWORDS: Mueller matrices, Spatial frequencies, Bidirectional reflectance transmission function, Scattering, White matter, Polydimethylsiloxane, Biomedical optics, Polarization, Thalamus, Polarimetry

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Proceedings Article | 3 October 2022 Presentation + Paper

Characterization of surface texture-measuring optical microscopes using a binary pseudo-random array standard

Ulf Griesmann, Keiko Munechika, T. Brian Renegar, X. Alan Zheng, Johannes Soons, Thomas Germer, Weilun Chao, Ian Lacey, Carlos Pina-Hernandez, Peter Takacs, Valeriy Yashchuk

Proceedings Volume 12223, 1222306 (2022) https://doi.org/10.1117/12.2633411

KEYWORDS: Microscopes, Spatial frequencies, Standards development, Confocal microscopy, Interferometry, Optical microscopes

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Proceedings Article | 7 March 2022 Presentation

Imaging of media with spatial frequency domain Mueller matrix imaging

Joseph Chue-Sang, Thomas Germer

Proceedings Volume PC11963, PC1196304 (2022) https://doi.org/10.1117/12.2615353

KEYWORDS: Tissues, Polarimetry, Scattering, Multilayers, Light sources, Collagen, Cancer, Anisotropy

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Proceedings Article | 1 April 2021 Presentation + Paper

Spatial frequency domain Mueller matrix imaging

Joseph Chue-Sang, Aaron Goldfain, Jeeseong Hwang, Thomas Germer

Proceedings Volume 11646, 116460E (2021) https://doi.org/10.1117/12.2576350

KEYWORDS: Polarimetry, Wave plates, Polarization, Multilayers, Modulation, Liquid crystals, Light sources, Condition numbers, Calibration, Biomedical optics

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Proceedings Article | 17 March 2021 Presentation + Paper

Depolarization in diffusely scattering media

Thomas Germer

Proceedings Volume 11646, 116460I (2021) https://doi.org/10.1117/12.2577888

KEYWORDS: Spatial frequencies, Scattering media, Scattering

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Proceedings Article | 20 August 2020 Presentation

Spatial frequency domain Mueller matrix imaging to distinguish between birefringent materials in depth

Joseph Chue-Sang, Thomas Germer

Proceedings Volume 11485, 114850F (2020) https://doi.org/10.1117/12.2568553

KEYWORDS: Polarimetry, Wave plates, Anisotropy, Multilayers, Light sources, Liquid crystals, Modulation, Polarization, Calibration, Condition numbers

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Proceedings Article | 20 August 2020 Presentation + Paper

pySCATMECH: a Python interface to the SCATMECH library of scattering codes

Thomas Germer

Proceedings Volume 11485, 114850J (2020) https://doi.org/10.1117/12.2568578

KEYWORDS: Bidirectional reflectance transmission function, Scattering, Particles, Reflectivity, Interfaces, Light scattering

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Proceedings Article | 14 May 2018 Presentation + Paper

Polarized single-scattering phase function determined for a common reflectance standard from bidirectional reflectance measurements

Thomas Germer

Proceedings Volume 10655, 1065504 (2018) https://doi.org/10.1117/12.2305417

KEYWORDS: Scattering, Bidirectional reflectance transmission function, Reflectivity, Radiative transfer, Absorption, Polarization, Laser scattering, Data modeling, Refraction, Standards development

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Proceedings Article | 19 February 2018 Presentation + Paper

Scattering properties of ultrafast laser-induced refractive index shaping lenticular structures in hydrogels

Kaitlin Wozniak, Thomas Germer, Sam Butler, Daniel Brooks, Krystel Huxlin, Jonathan Ellis

Proceedings Volume 10522, 1052205 (2018) https://doi.org/10.1117/12.2290204

KEYWORDS: Diffraction, Cornea, Scattering, Light scattering, Femtosecond phenomena, Laser vision correction, Refractive index, Scatter measurement, Laser tissue interaction

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Proceedings Article | 11 October 2016 Paper

Goniometric and hemispherical reflectance and transmittance measurements of fused silica diffusers

Paul Lemaillet, Heather Patrick, Thomas Germer, Leonard Hanssen, B. Carol Johnson, Georgi Georgiev

Proceedings Volume 9961, 996109 (2016) https://doi.org/10.1117/12.2237975

KEYWORDS: IRIS Consortium, Diffusers, Reflectivity, Transmittance, Silica, Scattering, Bidirectional reflectance transmission function, Optical spheres, Sensors, Integrating spheres

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Proceedings Article | 26 September 2016 Paper

Mueller matrix bidirectional reflectance distribution function measurements and modeling of textured silicon surfaces

Thomas Germer, Martin Foldyna, Zuzana Mrazkova, Guillaume Fischer, Etienne Drahi

Proceedings Volume 9961, 996107 (2016) https://doi.org/10.1117/12.2236976

KEYWORDS: Bidirectional reflectance transmission function, Silicon, Scattering, Diffraction, Polarization, Reflection, Reflectivity, Light scattering, Retroreflectors, Mueller matrices

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Proceedings Article | 17 April 2014 Paper

Improved measurement capabilities at the NIST EUV reflectometry facility

C. Tarrio, S. Grantham, T. Germer, J. Rife, T. Lucatorto, M. Kriese, Y. Platonov, L. Jiang, J. Rodriguez

Proceedings Volume 9048, 90481I (2014) https://doi.org/10.1117/12.2046290

KEYWORDS: Sensors, Extreme ultraviolet, Reflectometry, Polarization, Radiation effects, Reflectivity, Motion models, EUV optics, 3D modeling, Data modeling

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Proceedings Article | 27 September 2013 Paper

Assessing consistency of a Mueller matrix measurement by rotation of the sample under test

Thomas Germer

Proceedings Volume 8873, 887303 (2013) https://doi.org/10.1117/12.2024853

KEYWORDS: Polarimetry, Calibration, Wave plates, Sensors, Transmittance, Mueller matrices, Modulation, Matrices, Error analysis, Polarizers

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Proceedings Article | 23 September 2013 Paper

The NIST Robotic Optical Scatter Instrument (ROSI) and its application to BRDF measurements of diffuse reflectance standards for remote sensing

Heather Patrick, Clarence Zarobila, Thomas Germer

Proceedings Volume 8866, 886615 (2013) https://doi.org/10.1117/12.2023095

KEYWORDS: Bidirectional reflectance transmission function, Receivers, Sensors, Robotics, Scattering, Reflectivity, Light sources, Polarization, Remote sensing, Standards development

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Proceedings Article | 10 April 2013 Paper

Intercomparison between optical and x-ray scatterometry measurements of FinFET structures

P. Lemaillet, T. Germer, R. Joseph Kline, Daniel Sunday, Chengqing Wang, Wen-li Wu

Proceedings Volume 8681, 86810Q (2013) https://doi.org/10.1117/12.2011144

KEYWORDS: X-rays, X-ray optics, Scatterometry, Metrology, Silica, Scattering, Interfaces, Scatter measurement, Silicon

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Proceedings Article | 10 April 2013 Paper

Gaps analysis for CD metrology beyond the 22nm node

Benjamin Bunday, Thomas Germer, Victor Vartanian, Aaron Cordes, Aron Cepler, Charles Settens

Proceedings Volume 8681, 86813B (2013) https://doi.org/10.1117/12.2012472

KEYWORDS: Critical dimension metrology, Metrology, Scanning helium ion microscopy, 3D metrology, Silicon, Image resolution, Etching, Scanning electron microscopy, Oxides

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Proceedings Article | 15 October 2012 Paper

Tunable supercontinuum fiber laser source for BRDF measurements in the STARR II gonioreflectometer

Heather Patrick, Clarence Zarobila, Thomas Germer, Victor Ying, Catherine Cooksey, Benjamin Tsai

Proceedings Volume 8495, 84950K (2012) https://doi.org/10.1117/12.930742

KEYWORDS: Bidirectional reflectance transmission function, Receivers, Polarization, Light sources, Sensors, Reflectivity, Light scattering, Scattering, Optical testing, Silicon

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Proceedings Article | 15 October 2012 Paper

Upper roughness limitations on the TIS/RMS relationship

John Stover, Sven Schröder, Thomas Germer

Proceedings Volume 8495, 849503 (2012) https://doi.org/10.1117/12.930770

KEYWORDS: Diffraction, Reflectivity, Silicon, Ocean optics, Light scattering, Diffraction gratings, Spatial frequencies, Specular reflections, Integrated optics, Radar

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SPIE Journal Paper | 9 July 2012 Open Access

Out-of-plane Stokes imaging polarimeter for early skin cancer diagnosis

Pejhman Ghassemi, Paul Lemaillet, Jessica Ramella-Roman, Jeffrey Shupp, Suraj Venna, Marc Boisvert, Katherine Flanagan, Marion Jordan, Thomas Germer

JBO, Vol. 17, Issue 7, 076014, (July 2012) https://doi.org/10.1117/12.10.1117/1.JBO.17.7.076014

KEYWORDS: Polarization, Scattering, Skin, Polarimetry, Light scattering, Melanoma, Skin cancer, Calibration, Imaging systems, Polarizers

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Proceedings Article | 10 September 2011 Paper

Mueller matrix bidirectional reflectance distribution function measurements and modeling of diffuse reflectance standards

Thomas Germer, Heather Patrick

Proceedings Volume 8160, 81600D (2011) https://doi.org/10.1117/12.892713

KEYWORDS: Scattering, Bidirectional reflectance transmission function, Chemical elements, Light scattering, Radiative transfer, Polarimetry, Rayleigh scattering, Absorption, Reflectivity, Standards development

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Proceedings Article | 20 April 2011 Paper

Mueller matrix ellipsometry of artificial non-periodic line edge roughness in presence of finite numerical aperture

Martin Foldyna, Thomas Germer, Brent Bergner

Proceedings Volume 7971, 79710N (2011) https://doi.org/10.1117/12.879518

KEYWORDS: Line edge roughness, Data modeling, Ellipsometry, Mueller matrices, Spectroscopy, Line width roughness, Silicon, Numerical modeling, Process control, Optics manufacturing

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Proceedings Article | 2 April 2010 Paper

Effect of bandwidth and numerical aperture in optical scatterometry

Thomas Germer, Heather Patrick

Proceedings Volume 7638, 76381F (2010) https://doi.org/10.1117/12.846776

KEYWORDS: Scatterometry, Silicon, Binary data, Scatter measurement, Solids, Computer simulations, Integrated optics, Standards development, Metrology, Process control

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Proceedings Article | 4 September 2009 Paper

A spectroscopic polarimeter for detecting chiral signatures in astrobiological samples

Baoliang Wang, William Sparks, Thomas Germer, Andrew Leadbetter

Proceedings Volume 7441, 744108 (2009) https://doi.org/10.1117/12.826378

KEYWORDS: Polarization, Polarimetry, Signal detection, Digital signal processing, Polarizers, Spectroscopy, Sensors, Dielectric polarization, Signal processing, Modulation

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Proceedings Article | 23 March 2009 Paper

Effect of line-width roughness on optical scatterometry measurements

Brent Bergner, Thomas Germer, Thomas Suleski

Proceedings Volume 7272, 72720U (2009) https://doi.org/10.1117/12.813770

KEYWORDS: Line width roughness, Scatterometry, Reflectivity, Scatter measurement, Optical testing, Modulation, Birefringence, Edge roughness, Silicon, Polarization

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Proceedings Article | 23 March 2009 Paper

Developing an uncertainty analysis for optical scatterometry

Thomas Germer, Heather Patrick, Richard Silver, Benjamin Bunday

Proceedings Volume 7272, 72720T (2009) https://doi.org/10.1117/12.814835

KEYWORDS: Scatterometry, Scatter measurement, Optical properties, Photoresist materials, Uncertainty analysis, Spectroscopy, Silicon, Oxides, Error analysis, Data modeling

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Proceedings Article | 19 March 2009 Open Access

Improving optical measurement accuracy using multi-technique nested uncertainties

R. Silver, N. F. Zhang, B. Barnes, H. Zhou, A. Heckert, R. Dixson, T. Germer, B. Bunday

Proceedings Volume 7272, 727202 (2009) https://doi.org/10.1117/12.816569

KEYWORDS: Metrology, Critical dimension metrology, Atomic force microscopy, Scatterometry, Optical testing, Scanning electron microscopy, Uncertainty analysis, Reflectivity, Microscopy, Line edge roughness

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Proceedings Article | 18 March 2009 Paper

In situ measurement of annealing-induced line shape evolution in nanoimprinted polymers using scatterometry

Heather Patrick, Thomas Germer, Yifu Ding, Hyun Wook Ro, Lee Richter, Christopher Soles

Proceedings Volume 7271, 727128 (2009) https://doi.org/10.1117/12.815360

KEYWORDS: Scatterometry, Data modeling, Annealing, Polymers, Ellipsometry, Solids, Atomic force microscopy, Nanoimprint lithography, In situ metrology, Statistical modeling

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Proceedings Article | 9 September 2008 Paper

Extraction of trench geometry and linewidth of nanoscale grating targets in (110)-oriented silicon using angle-resolved scatterometry

Heather Patrick, Thomas Germer, Michael Cresswell, Bin Li, Huai Huang, Paul Ho

Proceedings Volume 7042, 70420B (2008) https://doi.org/10.1117/12.796286

KEYWORDS: Scatterometry, Silicon, Reflectivity, Scanning electron microscopy, Scatter measurement, Oxides, Data modeling, Electron beam lithography, Scattering, Crystals

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Proceedings Article | 25 March 2008 Paper

Modeling the effect of finite size gratings on scatterometry measurements

Elizabeth Kenyon, Michael Cresswell, Heather Patrick, Thomas Germer

Proceedings Volume 6922, 69223P (2008) https://doi.org/10.1117/12.772769

KEYWORDS: Diffraction, Reflectivity, Scatterometry, Diffraction gratings, Gaussian beams, Scatter measurement, Metrology, Sensors, Silicon, Optical simulations

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SPIE Journal Paper | 1 January 2008

Optical critical dimension measurement of silicon grating targets using back focal plane scatterfield microscopy

Heather Patrick, Ravikiran Attota, Bryan Barnes, Thomas Germer, Ronald Dixson, Michael Stocker, Richard Silver, Michael Bishop

JM3, Vol. 7, Issue 01, 013012, (January 2008) https://doi.org/10.1117/12.10.1117/1.2885275

KEYWORDS: Reflectivity, Diffraction, Silicon, Microscopy, Scanning electron microscopy, Optical testing, Objectives, Atomic force microscopy, Diffraction gratings, Microscopes

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Proceedings Article | 13 September 2007 Paper

Truncated singular value decomposition method for calibrating a Stokes polarimeter

Bruno Boulbry, Jessica Ramella-Roman, Thomas Germer

Proceedings Volume 6682, 66820M (2007) https://doi.org/10.1117/12.734452

KEYWORDS: Polarimetry, Calibration, Polarizers, Polarization, Wave plates, Light emitting diodes, Matrices, Optical components, Refractive index, Liquid crystals

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Proceedings Article | 10 September 2007 Paper

Progress toward traceable nanoscale optical critical dimension metrology for semiconductors

Heather Patrick, Thomas Germer

Proceedings Volume 6672, 66720L (2007) https://doi.org/10.1117/12.734080

KEYWORDS: Reflectivity, Scatterometry, Scanning electron microscopy, Data modeling, Semiconductors, Optical testing, Scatter measurement, Polarization, Silicon, Critical dimension metrology

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Proceedings Article | 26 April 2007 Paper

Hemispherical imaging of skin with polarized light

Jessica Ramella-Roman, Bruno Boulbry, Thomas Germer

Proceedings Volume 6535, 65350U (2007) https://doi.org/10.1117/12.740962

KEYWORDS: Skin, Scattering, Data modeling, Light scattering, Polarization, Glasses, Polarizers, Solids, Diamond, Multiple scattering

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Proceedings Article | 5 April 2007 Paper

Fundamental limits of optical critical dimension metrology: a simulation study

Richard Silver, Thomas Germer, Ravikiran Attota, Bryan Barnes, Benjamin Bunday, John Allgair, Egon Marx, Jay Jun

Proceedings Volume 6518, 65180U (2007) https://doi.org/10.1117/12.716604

KEYWORDS: Scatterometry, Reflectivity, Polarization, Finite-difference time-domain method, Data modeling, Diffraction, Oxides, Silicon, Critical dimension metrology, Amorphous silicon

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Proceedings Article | 5 April 2007 Paper

Modeling the effect of line profile variation on optical critical dimension metrology

Thomas Germer

Proceedings Volume 6518, 65180Z (2007) https://doi.org/10.1117/12.704246

KEYWORDS: Monte Carlo methods, Diffraction gratings, Diffraction, Silicon, Light scattering, Reflectivity, Scattering, Photoresist materials, Critical dimension metrology, Polarization

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Proceedings Article | 24 March 2006 Paper

Simulations of optical microscope images

Thomas Germer, Egon Marx

Proceedings Volume 6152, 61520I (2006) https://doi.org/10.1117/12.656370

KEYWORDS: Silicon, Polarization, Microscopes, Monochromatic aberrations, Optical microscopes, Radio propagation, Sensors, Magnetism, Optical microscopy, Scatterometry

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Proceedings Article | 24 March 2006 Paper

Scatterfield microscopy using back focal plane imaging with an engineered illumination field

Heather Patrick, Ravikiran Attota, Bryan Barnes, Thomas Germer, Michael Stocker, Richard Silver, Michael Bishop

Proceedings Volume 6152, 61520J (2006) https://doi.org/10.1117/12.656452

KEYWORDS: Reflectivity, Diffraction, Silicon, Scatterometry, Polarization, Diffraction gratings, Cameras, Illumination engineering, Data conversion, Microscopes

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Proceedings Article | 22 February 2006 Paper

A novel hemispherical spectro-polarimetric scattering instrument for skin lesion imaging

Bruno Boulbry, Thomas Germer, Jessica Ramella-Roman

Proceedings Volume 6078, 60780R (2006) https://doi.org/10.1117/12.648164

KEYWORDS: Skin, Polarization, Fiber optic illuminators, Light scattering, Scattering, Imaging systems, Cameras, Tissues, Polarizers, Light emitting diodes

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Proceedings Article | 20 February 2006 Paper

High sensitivity measurements of the scattering dispersion of phantoms using spectral domain optical coherence tomography

Shellee Dyer, Tasshi Dennis, Paul Williams, Lara Street, Shelley Etzel, R. Joseph Espejo, Thomas Germer, Thomas Milner

Proceedings Volume 6079, 60791Q (2006) https://doi.org/10.1117/12.649180

KEYWORDS: Mie scattering, Optical spheres, Optical coherence tomography, Scattering, Refractive index, Light scattering, Scatter measurement, Interferometers, Microscopes, Tissues

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Proceedings Article | 10 May 2005 Paper

Application of through-focus focus-metric analysis in high resolution optical metrology

Ravikiran Attota, Richard Silver, Thomas Germer, Michael Bishop, Robert Larrabee, Michael Stocker, Lowel Howard

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.621106

KEYWORDS: Fermium, Frequency modulation, Silicon, Indium arsenide, Destructive interference, Optical resolution, Optical metrology, Metrology, Process control, Optical microscopes

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Proceedings Article | 10 May 2005 Paper

High-resolution optical metrology

R. Silver, R. Attota, M. Stocker, M. Bishop, L. Howard, T. Germer, E. Marx, M. Davidson, R. Larrabee

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.606231

KEYWORDS: Overlay metrology, Metrology, Scatterometry, Critical dimension metrology, Illumination engineering, Scanning electron microscopy, Microscopy, Optical imaging, Scattering, Optical metrology

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Proceedings Article | 25 April 2005 Paper

Out-of-plane polarimetric imaging of skin: surface and subsurface effects

Jessica Ramella-Roman, Donald Duncan, Thomas Germer

Proceedings Volume 5686, (2005) https://doi.org/10.1117/12.592399

KEYWORDS: Skin, Scattering, Light scattering, Cameras, Picosecond phenomena, Gold, Glasses, Polarization, Error analysis, Polarimetry

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Proceedings Article | 12 December 2003 Paper

Polarized light diffusely scattered under smooth and rough interfaces

Thomas Germer

Proceedings Volume 5158, (2003) https://doi.org/10.1117/12.505979

KEYWORDS: Scattering, Light scattering, Interfaces, Rayleigh scattering, Polarization, Data modeling, Refraction, Reflectivity, Solids, Bidirectional reflectance transmission function

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Proceedings Article | 4 November 2003 Paper

Characterizing surface roughness of thin films by polarized light scattering

Thomas Germer, Michael Fasolka

Proceedings Volume 5188, (2003) https://doi.org/10.1117/12.506909

KEYWORDS: Interfaces, Scattering, Light scattering, Dielectric polarization, Polarization, Thin films, Dielectrics, Silicon, Surface roughness, Data modeling

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Proceedings Article | 11 November 2002 Paper

Measurement of the 100-nm NIST SRM 1963 by lase surface light scattering

Thomas Germer, George Mulholland, Jung Kim, Sheryl Ehrman

Proceedings Volume 4779, (2002) https://doi.org/10.1117/12.451747

KEYWORDS: Particles, Scattering, Optical spheres, Light scattering, Semiconducting wafers, Silicon, Sensors, Polarization, Laser scattering, Scatter measurement

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Proceedings Article | 22 October 2002 Paper

Measurement of lithographic overlay by light-scattering ellipsometry

Thomas Germer

Proceedings Volume 4780, (2002) https://doi.org/10.1117/12.453789

KEYWORDS: Interfaces, Light scattering, Scattering, Overlay metrology, Ellipsometry, Semiconducting wafers, Photomasks, Polarization, Scatter measurement, Lithography

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Proceedings Article | 6 June 2002 Paper

Colorimetric characterization of pearlescent coatings

Maria Nadal, Thomas Germer

Proceedings Volume 4421, (2002) https://doi.org/10.1117/12.464577

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Proceedings Article | 10 December 2001 Paper

Polarized light scattering from metallic particles on silicon wafers

Jung Kim, Sheryl Ehrman, George Mulholland, Thomas Germer

Proceedings Volume 4449, (2001) https://doi.org/10.1117/12.450105

KEYWORDS: Optical spheres, Particles, Light scattering, Scattering, Copper, Gold, Silicon, Polarization, Semiconducting wafers, Reflection

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Proceedings Article | 23 October 2001 Paper

Modeling the appearance of special effect pigment coatings

Thomas Germer, Maria Nadal

Proceedings Volume 4447, (2001) https://doi.org/10.1117/12.446721

KEYWORDS: Scattering, Light scattering, Polarization, Bidirectional reflectance transmission function, Multiple scattering, Reflection, Dielectric polarization, Data modeling, Interfaces, Laser scattering

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Proceedings Article | 26 September 2000 Paper

Polarized light-scattering measurements of polished and etched steel surfaces

Thomas Germer, Thomas Rinder, Hendrik Rothe

Proceedings Volume 4100, (2000) https://doi.org/10.1117/12.401654

KEYWORDS: Light scattering, Scattering, Polarization, Polishing, Spatial frequencies, Atomic force microscopy, Scatter measurement, Dielectric polarization, Surface finishing, Rayleigh scattering

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Proceedings Article | 25 October 1999 Paper

Polarization of light scattered by spheres on a dielectric film

Lipiin Sung, George Mulholland, Thomas Germer

Proceedings Volume 3784, (1999) https://doi.org/10.1117/12.366712

KEYWORDS: Optical spheres, Light scattering, Particles, Silicon, Data modeling, Dielectric polarization, Dielectrics, Silicon films, Systems modeling, Scattering

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Proceedings Article | 25 October 1999 Paper

Multidetector hemispherical polarized optical scattering instrument

Thomas Germer

Proceedings Volume 3784, (1999) https://doi.org/10.1117/12.366713

KEYWORDS: Sensors, Light scattering, Optical spheres, Scattering, Silicon, Polarization, Polarizers, Dielectric polarization, Signal detection, Semiconducting wafers

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Proceedings Article | 29 March 1999 Paper

Polarization of light scattered by particles on silicon wafers

Lipiin Sung, George Mulholland, Thomas Germer

Proceedings Volume 3619, (1999) https://doi.org/10.1117/12.343715

KEYWORDS: Particles, Light scattering, Polarization, Optical spheres, Silicon, Atmospheric particles, Semiconducting wafers, Ellipsometry, Scattering, Latex

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Proceedings Article | 30 October 1998 Paper

Polarization of out-of-plane optical scatter from SiO2 films grown on photolithographically generated microrough silicon

Thomas Germer, Bradley Scheer

Proceedings Volume 3426, (1998) https://doi.org/10.1117/12.328451

KEYWORDS: Light scattering, Interfaces, Dielectric polarization, Scattering, Data modeling, Dielectrics, Silicon, Ellipsometry, Polarization, Silicon films

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Proceedings Article | 1 April 1998 Paper

Application of bidirectional ellipsometry to the characterization of roughness and defects in dielectric layers

Thomas Germer

Proceedings Volume 3275, (1998) https://doi.org/10.1117/12.304397

KEYWORDS: Light scattering, Scattering, Dielectric polarization, Interfaces, Dielectrics, Ellipsometry, Silicon, Rayleigh scattering, Particles, Light

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Proceedings Article | 3 October 1997 Paper

Bidirectional ellipsometry and its application to the characterization of surfaces

Thomas Germer, Clara Asmail

Proceedings Volume 3121, (1997) https://doi.org/10.1117/12.278968

KEYWORDS: Light scattering, Scattering, Polarization, Ellipsometry, Rayleigh scattering, Glasses, Bidirectional reflectance transmission function, Surface finishing, Silicon, Polishing

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Proceedings Article | 26 September 1997 Paper

Scattering from sinusoidal gratings

Byong Chon Park, Theodore Vorburger, Thomas Germer, Egon Marx

Proceedings Volume 3141, (1997) https://doi.org/10.1117/12.287806

KEYWORDS: Scattering, Light scattering, Diffraction, Laser scattering, Diffraction gratings, Rayleigh scattering, Bidirectional reflectance transmission function, Holography, Scatter measurement, Polarization

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Proceedings Article | 26 September 1997 Paper

Goniometric optical scatter instrument for bidirectional reflectance distribution function measurements with out-of-plane and polarimetry capabilities

Thomas Germer, Clara Asmail

Proceedings Volume 3141, (1997) https://doi.org/10.1117/12.279240

KEYWORDS: Bidirectional reflectance transmission function, Polarization, Scattering, Polarimetry, Silicon, Receivers, Semiconducting wafers, Wafer-level optics, Wave plates, Information operations

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Proceedings Article | 4 November 1996 Paper

Proposed methodology for characterization of microroughness-induced optical scatter instrumentation

Thomas Germer, Clara Asmail

Proceedings Volume 2862, (1996) https://doi.org/10.1117/12.256204

KEYWORDS: Spatial frequencies, Silicon, Optics manufacturing, Semiconducting wafers, Wafer-level optics, Bidirectional reflectance transmission function, Light scattering, Polarization, Scatter measurement, Surface roughness

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Showing 5 of 61 publications

Conference Committee Involvement (8)

Polarized Light and Optical Angular Momentum for Biomedical Diagnostics 2025

25 January 2025 | San Francisco, California, United States

Polarized Light and Optical Angular Momentum for Biomedical Diagnostics 2024

27 January 2024 | San Francisco, California, United States

Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors V

24 August 2011 | San Diego, California, United States

Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III

28 August 2007 | San Diego, California, United States

Optical Fabrication, Testing, and Metrology II

13 September 2005 | Jena, Germany

Showing 5 of 8 Conference Committees

Course Instructor

SC492: Predicting, Modeling, and Interpreting Light Scattered by Surfaces

The measurement of light scattered by surfaces can be used to locate and identify roughness, particulates, and defects on a wide variety of materials. Applications include the inspection of silicon wafers, optics, and storage media, characterization of thin film roughness, identification of objects in remote sensing, and prediction of optical system performance. The aim of this course is to provide tools to engineers and scientists to enable them to predict scattering for different sources, differentiate amongst different scattering sources, and to design instrumentation that maximizes sensitivity or differentiation amongst scattering sources for their specific application. Emphasis will be placed on the use of the SCATMECH library of scattering codes and the Modeled Integrated Scatter Tool (MIST) in order to minimize the mathematics that can often be a barrier to those who would otherwise be interested in using optical scatter. The measurement of scatter is emphasized in SC1003 taught by John Stover.

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