Mr. Tongke Lin Profile

Tongke Lin

SPIE Involvement:

Author

Publications (1)

Proceedings Article | 3 October 2022 Poster

High-efficiency photolithographic NIR metalenses enabled by optical proximity correction with a neural-network lithographic model

Hsuehli Liu, Weiping Liao, Yuteng Chen, Shengsiang Su, Tongke Lin, Jiamin Shieh, Peichen Yu, Youchia Chang

Proceedings Volume PC12195, PC1219521 (2022) https://doi.org/10.1117/12.2644847

KEYWORDS: Optical proximity correction, Lithography, Optical lithography, Near infrared, Photoresist materials, Critical dimension metrology, Systems modeling, Semiconductors, Photoresist developing, Photomasks

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years