Toshikazu Umatate
Operating Officer/General Manager at Nikon Corp
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537214
KEYWORDS: Lithography, Scanners, Distortion, Semiconducting wafers, Systems engineering, Reticles, Projection systems, Wavefront aberrations, Semiconductors, Wavefronts

Proceedings Article | 28 August 2003 Paper
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504178
KEYWORDS: Photomasks, Reticles, Mask making, Deep ultraviolet, Optical lithography, Semiconductors, Printing, Manufacturing, Lithography, Critical dimension metrology

Proceedings Article | 5 September 2001 Paper
Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438376
KEYWORDS: Photomasks, Critical dimension metrology, Lithography, Error analysis, Semiconducting wafers, Metals, Optical proximity correction, Printing, Inspection, Measurement devices

Proceedings Article | 22 January 2001 Paper
Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410713
KEYWORDS: Reticles, Photomasks, Manufacturing, Critical dimension metrology, System on a chip, Optical lithography, Terbium, Optical alignment, Semiconducting wafers, Optical proximity correction

Proceedings Article | 22 January 2001 Paper
Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410728
KEYWORDS: Photomasks, Lithography, Critical dimension metrology, Semiconducting wafers, Opacity, Optical proximity correction, Optical lithography, Error analysis, Inspection, Chromium

Proceedings Article | 19 July 2000 Paper
Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392077
KEYWORDS: Reticles, Photomasks, Critical dimension metrology, Manufacturing, System on a chip, Optical proximity correction, Mask making, Semiconducting wafers, Digital signal processing, Fabrication

Proceedings Article | 19 July 2000 Paper
Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392096
KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Critical dimension metrology, System on a chip, Lithography, Printing, Kinematics, Scanning electron microscopy, Process engineering

Showing 5 of 7 publications
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