Satoshi Tanaka
Chief Specialist at KIOXIA Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (75)

Proceedings Article | 26 March 2019 Presentation + Paper
Proceedings Volume 10957, 109571C (2019) https://doi.org/10.1117/12.2515273
KEYWORDS: Photomasks, Extreme ultraviolet, Tantalum, Semiconducting wafers, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography, Lithographic illumination, Line width roughness, Line edge roughness

Proceedings Article | 18 March 2016 Paper
Satoshi Tanaka, Shunko Magoshi, Hidemi Kawai, Soichi Inoue, Wylie Rosenthal, Luc Girard, Lou Marchetti, Bob Kestner, John Kincade
Proceedings Volume 9776, 97761N (2016) https://doi.org/10.1117/12.2219368
KEYWORDS: Optical lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Process control, Photomasks, Lithography, Optical design, Projection systems, Polarization, Mirrors, Reticles, Semiconducting wafers

Proceedings Article | 18 March 2016 Paper
Eishi Shiobara, Yukiko Kikuchi, Shinji Mikami, Takeshi Sasami, Takashi Kamizono, Shinya Minegishi, Takakazu Kimoto, Toru Fujimori, Takeo Watanabe, Tetsuo Harada, Hiroo Kinoshita, Satoshi Tanaka
Proceedings Volume 9776, 97762H (2016) https://doi.org/10.1117/12.2219424
KEYWORDS: Contamination, Extreme ultraviolet, Extreme ultraviolet lithography, Metals, Hydrogen, Chemical elements, Mirrors, Reflectivity, Zirconium, Aluminum, Silicon, Germanium

SPIE Journal Paper | 11 March 2016
Yukihide Kohira, Chikaaki Kodama, Tomomi Matsui, Atsushi Takahashi, Shigeki Nojima, Satoshi Tanaka
JM3, Vol. 15, Issue 02, 021207, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021207
KEYWORDS: Computer engineering, Photomasks, Optical lithography, Double patterning technology, Computer programming, Overlay metrology, Detection and tracking algorithms, Communication engineering, Lithography, Logic

Proceedings Article | 26 March 2015 Paper
Yukihide Kohira, Chikaaki Kodama, Tomomi Matsui, Atsushi Takahashi, Shigeki Nojima, Satoshi Tanaka
Proceedings Volume 9427, 94270B (2015) https://doi.org/10.1117/12.2085285
KEYWORDS: Photomasks, Optical lithography, Lithography, Overlay metrology, Double patterning technology, Computer programming, Design for manufacturability, Fabrication, Extreme ultraviolet, Logic

Showing 5 of 75 publications
Conference Committee Involvement (8)
International Conference on Extreme Ultraviolet Lithography 2024
30 September 2024 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2023
2 October 2023 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2022
26 September 2022 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2021
27 September 2021 | Online Only, United States
International Conference on Extreme Ultraviolet Lithography 2020
21 September 2020 | Online Only, California, United States
Showing 5 of 8 Conference Committees
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