Dr. Wei Liu Profile

Dr. Wei Liu

Senior Process Engineer at Applied Materials Inc

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Author

Publications (4)

Proceedings Article | 29 April 2004 Paper

In-tool process control for advanced patterning based on integrated metrology

David Mui, Hiroki Sasano, Wei Liu, John Yamartino, Andrew Skumanich

Proceedings Volume 5378, (2004) https://doi.org/10.1117/12.537444

KEYWORDS: Etching, Semiconducting wafers, Process control, Metrology, Critical dimension metrology, Scatterometry, Data modeling, Optical lithography, Feedback loops, Control systems

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Proceedings Article | 17 December 2003 Paper

Beyond k₁=0.25 lithography: 70-nm L/S patterning using KrF scanners

Takeaki Ebihara, Marc Levenson, Wei Liu, Jim He, Wendy Yeh, Sang Ahn, Toshihiro Oga, Meihua Shen, Hichem M'saad

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518104

KEYWORDS: Photomasks, Etching, Optical lithography, Lithography, Semiconducting wafers, Scanning electron microscopy, Photoresist processing, Reflectivity, Optical alignment, Scanners

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Proceedings Article | 26 June 2003 Paper

Generating sub-30-nm polysilicon gates using PECVD amorphous carbon as hardmask and anti-reflective coating

Wei Liu, David Mui, Thorston Lill, May Wang, Christopher Bencher, Michael Kwan, Wendy Yeh, Takeaki Ebihara, Toshihiro Oga

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485532

KEYWORDS: Etching, Carbon, Photoresist materials, Lithography, Photomasks, 193nm lithography, Critical dimension metrology, Reflectivity, Antireflective coatings, Optical lithography

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Proceedings Article | 16 July 2002 Paper

Line-profile and critical-dimension correlation between a normal-incidence optical CD metrology system and SEM

Weidong Yang, Roger Lowe-Webb, Rahul Korlahalli, Vera Zhuang, Hiroki Sasano, Wei Liu, David Mui

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473425

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Photoresist materials, Diffraction gratings, Diffraction, Reflectivity, Finite element methods, Spectroscopy, Polarizers

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