Mr. Yuji Kobiyama Profile

Yuji Kobiyama

Dept Manager

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Publications (3)

Proceedings Article | 20 August 2004 Paper

Actinic aerial image measurement for qualification of defect on 157-nm photomask

Takashi Yasui, Iwao Higashikawa, Peter Kuschnerus, Wolfgang Degel, Klaus Boehm, Axel Zibold, Yuji Kobiyama, Jan-Peter Urbach, Christof Schilz, Silvio Teuber Semmler

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557762

KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Semiconductors, Metrology, Wafer-level optics, Image quality, Lithographic illumination, CCD cameras, Binary data

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Proceedings Article | 20 August 2004 Paper

Aerial image measurement technique for automated reticle defect disposition (ARDD) in wafer fabs

Axel Zibold, Rainer Schmid, B. Stegemann, Thomas Scheruebl, Wolfgang Harnisch, Yuji Kobiyama

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557811

KEYWORDS: Photomasks, Semiconducting wafers, Pellicles, Reticles, Inspection, Lithography, Scanners, Particles, Crystals, Polarization

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Proceedings Article | 28 August 2003 Paper

Actinic aerial image measurement tool for 157-nm mask qualification

Takashi Yasui, Iwao Higashikawa, Peter Kuschnerus, Thomas Engel, Axel Zibold, Claudia Hertfelder, Yuji Kobiyama, Jan-Peter Urbach, Christof Schilz, Armin Semmler

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504215

KEYWORDS: Photomasks, Binary data, CCD image sensors, CCD cameras, Image quality, Semiconducting wafers, Vacuum ultraviolet, Lithography, Vibration control, Optical resolution

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