CONFERENCE PROCEEDINGS
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Yun Tao Jiang
at GLOBALFOUNDRIES Singapore
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Publications (3)
Proceedings Article | 18 April 2013 Paper
High order wafer alignment for 20nm node logic process
Bumhwan Jeon, Shyam Pal, Sohan Mehta, Subramany Lokesh, Yun Tao Jiang, Chen Li, Mark Yelverton, Yayi Wei
Proceedings Volume 8681, 868110 (2013) https://doi.org/10.1117/12.2010709
KEYWORDS: Semiconducting wafers, Optical alignment, Distortion, Overlay metrology, Annealing, Transistors, Logic, Laser processing, Lithography, Semiconductor manufacturing
SPIE Journal Paper | 1 October 2011
Holistic metrology approach: hybrid metrology utilizing scatterometry, critical dimension-atomic force microscope and critical dimension-scanning electron microscope
Alok Vaid, Bin Bin Yan, Yun Tao Jiang, Mark Kelling, Carsten Hartig, John Allgair, Peter Ebersbach, Matthew Sendelbach, Narender Rana, Ahmad Katnani, Erin McLellan, Charles Archie, Cornel Bozdog, Helen Kim, Michael Sendler, Susan Ng, Boris Sherman, Boaz Brill, Igor Turovets, Ronen Urensky
JM3, Vol. 10, Issue 04, 043016, (October 2011) https://doi.org/10.1117/12.10.1117/1.3655726
KEYWORDS: Metrology, Scatterometry, Critical dimension metrology, Semiconducting wafers, Data modeling, Atomic force microscopy, Transmission electron microscopy, Inspection, 3D metrology
Proceedings Article | 29 March 2011 Paper
A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM
Proceedings Volume 7971, 797103 (2011) https://doi.org/10.1117/12.881632
KEYWORDS: Metrology, Critical dimension metrology, Scatterometry, Semiconducting wafers, Metals, Transmission electron microscopy, Data modeling, Atomic force microscopy, Inspection
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