CONFERENCE PROCEEDINGS
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Zack Huang
at Photronics DNP Mask Corp
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Author
Publications (5)
Proceedings Article | 26 August 2024 Paper
A study of CrOx composed progressive defect on attenuated PSM and its damaged-free removal process
Proceedings Volume 13177, 131770J (2024) https://doi.org/10.1117/12.3032717
KEYWORDS: Chromium, Plasma, Mask cleaning, Etching, Plasma treatment
Proceedings Article | 26 August 2024 Paper
A study on directional damaged defect in photomask manufacturing process
Proceedings Volume 13177, 131770K (2024) https://doi.org/10.1117/12.3032447
KEYWORDS: Scanning electron microscopy, Inspection, Etching, Chromium, Photomasks, Mask cleaning, Critical dimension metrology, Manufacturing, Electrical conductivity, Photomask technology
Proceedings Article | 29 September 2023 Paper
MoSi stain defect reduction in photo resist strip process
Proceedings Volume 12915, 129150F (2023) https://doi.org/10.1117/12.2684159
KEYWORDS: Etching, Chromium, Plasma etching, Photoresist processing, Mask cleaning, Liquids
Proceedings Article | 16 September 2022 Paper
Massive tiny MoSi defect reduction in NCAR photoresist blank
Joyce Wang, Ansel Huang, Mazer Li, Josh Cheng, Bin Lin, Ewin Zhuo, Gerrard Chen, Kevin Yu, Yu-Kuang Huang, Zack Huang
Proceedings Volume 12325, 123250C (2022) https://doi.org/10.1117/12.2640450
KEYWORDS: Etching, Inspection, Photoresist materials, Photomasks, Photoresist developing, Plasma, Manufacturing, Reactive ion etching, Plasma etching, Photoresist processing
Proceedings Article | 27 June 2019 Paper
A study of airborne molecular contamination to Cr etching process
Yuan Hsu, Yutaka Satou, Heng-Jen Lee, Zack Huang
Proceedings Volume 11178, 111780M (2019) https://doi.org/10.1117/12.2530983
KEYWORDS: Contamination, Chromium, Etching, Chlorine, Plasma, Particles, Inspection, Photomasks, Dry etching, Scanning electron microscopy
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