Deep-UV lithography using continuous-wave 266-nm radiation from an all solid state frequency quadrupled Nd:YAG laser

Hiroshi Suganuma; Minoru Takeda; Michio Oka; Naoto Ozaki; Motohisa Haga; Shigeo R. Kubota

doi:10.1117/12.209243

26 May 1995 Deep-UV lithography using continuous-wave 266-nm radiation from an all solid state frequency quadrupled Nd:YAG laser

Hiroshi Suganuma, Minoru Takeda, Michio Oka, Naoto Ozaki, Motohisa Haga, Shigeo R. Kubota

Author Affiliations +

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209243
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

A new lithography technique using continuous wave (CW) 266 nm radiation from an all solid state frequency quadrupled Nd:YAG laser is described and demonstrated. This laser has proved to be a highly efficient and promising deep UV light source in fabrication of 0.25 micron design rule device. Furthermore, we obtained 0.2 micron L/S pattern with phase shift mask. Speckle free images are obtained with rotating diffuser. The performance and potential of this new laser as a light source of microlithography are discussed and compared with KrF excimer laser theoretically and experimentally.

Citation Download Citation

Hiroshi Suganuma, Minoru Takeda, Michio Oka, Naoto Ozaki, Motohisa Haga, and Shigeo R. Kubota "Deep-UV lithography using continuous-wave 266-nm radiation from an all solid state frequency quadrupled Nd:YAG laser", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209243

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