Prof. Andrew K. Whittaker Profile

Prof. Andrew K. Whittaker

Professor at Univ of Queensland

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Publications (19)

Proceedings Article | 1 May 2023 Presentation + Paper

Fundamental studies of interactions between polymer substrate and precursor in sequential infiltration synthesis

Francis McCallum, Jiacheng Zhao, Md. Daloar Hossain, Joshua Kaitz, James Cameron, Peter Trefonas, Idriss Blakey, Hui Peng, Andrew Whittaker

Proceedings Volume 12498, 124980U (2023) https://doi.org/10.1117/12.2655986

KEYWORDS: Polymers, Polymethylmethacrylate, Spectroscopy, Molecular interactions, Molecules, FT-IR spectroscopy, Atomic layer deposition, Vacuum, Silicon, Semiconducting wafers

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Proceedings Article | 22 February 2021 Presentation + Paper

Spatial arrangement of block copolymer nanopatterns using photoactive homopolymer substrates

Jiacheng Zhao, Francis McCallum, Zhen Jiang, Joshua Kaitz, James Cameron, Peter Trefonas, Idriss Blakey, Hui Peng, Andrew Whittaker

Proceedings Volume 11612, 116120Q (2021) https://doi.org/10.1117/12.2586516

KEYWORDS: Nanostructures, Photomasks, Nanolithography, Control systems, Ultraviolet radiation, Thin films, Nanodomains, Interfaces, Fabrication, Electron beams

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Proceedings Article | 27 March 2017 Presentation + Paper

Embedded top-coat for reducing the effect out of band radiation in EUV lithography

Ke Du, Meiliana Siauw, David Valade, Marek Jasieniak, Nico Voelcker, Peter Trefonas, Jim Thackeray, Idriss Blakey, Andrew Whittaker

Proceedings Volume 10146, 101460D (2017) https://doi.org/10.1117/12.2270480

KEYWORDS: Polymers, Polymerization, Extreme ultraviolet lithography, Electron beam lithography, Photoresist materials, Polymer thin films, Extreme ultraviolet, Semiconducting wafers, Refractive index, Absorbance

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Proceedings Article | 21 March 2016 Paper

Systematic investigation of the synthesis, characterization and switching mechanism of metal oxide nanoparticle resists

Meiliana Siauw, Ke Du, David Valade, Peter Trefonas, James Thackeray, Andrew Whittaker, Idriss Blakey

Proceedings Volume 9779, 97790J (2016) https://doi.org/10.1117/12.2219638

KEYWORDS: Nanoparticles, Metals, Oxides, Extreme ultraviolet lithography, Photoresist materials, Optical lithography, Electron beam lithography, Scanning electron microscopy, Materials processing, Photoresist developing, Particles, Zirconium, Hafnium, Transmission electron microscopy

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Proceedings Article | 26 March 2013 Paper

Healing LER using directed self assembly: treatment of EUVL resists with aqueous solutions of block copolymers

Ya-Mi Chuang, Han-Hao Cheng, Kevin Jack, Andrew Whittaker, Idriss Blakey

Proceedings Volume 8680, 868009 (2013) https://doi.org/10.1117/12.2012488

KEYWORDS: Polymers, Annealing, Line edge roughness, Lithography, Semiconducting wafers, Atomic force microscopy, Electron beam lithography, Directed self assembly, Extreme ultraviolet lithography, Photoresist materials

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Proceedings Article | 21 March 2012 Paper

EUVL compatible LER solutions using functional block copolymers

Han-Hao Cheng, Imelda Keen, Anguang Yu, Ya-Mi Chuang, Idriss Blakey, Kevin Jack, Michael Leeson, Todd Younkin, Andrew Whittaker

Proceedings Volume 8323, 83231O (2012) https://doi.org/10.1117/12.916744

KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Picosecond phenomena, Polymers, Lithography, Directed self assembly, Photoresist materials, Etching, Glasses, Reactive ion etching

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Proceedings Article | 24 December 2011 Paper

Effect of nanoholes on the plasmonic properties of star nanostructures

Shaoli Zhu, Andrew Whittaker, Idriss Blakey

Proceedings Volume 8204, 82042M (2011) https://doi.org/10.1117/12.905409

KEYWORDS: Nanostructures, Plasmonics, Finite-difference time-domain method, Stars, Silver, Near field, Nano optics, Computer simulations, Numerical simulations, Nanoparticles

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Proceedings Article | 16 April 2011 Paper

Sensitive polysulfone based chain scissioning resists for 193nm lithography

Yong Keng Goh, Lan Chen, Anneke Dorgelo, Xie Peng, Neal Lafferty, Bruce Smith, Paul Zimmerman, Warren Montgomery, Idriss Blakey, Andrew Whittaker

Proceedings Volume 7972, 79722E (2011) https://doi.org/10.1117/12.881700

KEYWORDS: Line edge roughness, Polymers, Absorbance, Water, Sulfur, Scanning electron microscopy, Lithography, Double patterning technology, 193nm lithography, Coating

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Proceedings Article | 4 April 2011 Paper

Electron beam induced freezing of positive tone, EUV resists for directed self assembly applications

Han-Hao Cheng, Imelda Keen, Anguang Yu, Ya-Mi Chuang, Idriss Blakey, Kevin Jack, Michael Leeson, Todd Younkin, Andrew Whittaker

Proceedings Volume 7970, 79701V (2011) https://doi.org/10.1117/12.881491

KEYWORDS: Electron beam lithography, Annealing, Double patterning technology, Extreme ultraviolet, Line edge roughness, Electron beams, Directed self assembly, Scanning electron microscopy, Extreme ultraviolet lithography, Photoresist materials

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Proceedings Article | 30 March 2010 Paper

Non-chemically amplified resists for 193-nm immersion lithography: influence of absorbance on performance

Lan Chen, Yong-Keng Goh, Kirsten Lawrie, Bruce Smith, Warren Montgomery, Paul Zimmerman, Idriss Blakey, Andrew Whittaker

Proceedings Volume 7639, 76390V (2010) https://doi.org/10.1117/12.846971

KEYWORDS: Polymers, Absorbance, Lithography, Line edge roughness, Polymerization, Optical lithography, Water, Immersion lithography, Semiconducting wafers, Refractive index

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Proceedings Article | 23 March 2010 Paper

Polycarbonate based nonchemically amplified photoresists for extreme ultraviolet lithography

Idriss Blakey, Anguang Yu, James Blinco, Kevin Jack, Heping Liu, Michael Leeson, Wang Yueh, Todd Younkin, Andrew Whittaker

Proceedings Volume 7636, 763635 (2010) https://doi.org/10.1117/12.853620

KEYWORDS: Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Line edge roughness, Absorbance, Optical lithography, Semiconducting wafers, Carbonates, Scanning electron microscopy, Photoresist materials

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Proceedings Article | 1 April 2009 Paper

Non-CA resists for 193 nm immersion lithography: effects of chemical structure on sensitivity

Idriss Blakey, Lan Chen, Yong-Keng Goh, Kirsten Lawrie, Ya-Mi Chuang, Emil Piscani, Paul Zimmerman, Andrew Whittaker

Proceedings Volume 7273, 72733X (2009) https://doi.org/10.1117/12.814076

KEYWORDS: Polymers, Photons, Immersion lithography, Semiconducting wafers, Absorbance, Polymer thin films, FT-IR spectroscopy, Polymethylmethacrylate, Ionizing radiation, Optical lithography

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Proceedings Article | 1 April 2009 Paper

Development of polymers for non-CAR resists for EUV lithography

Andrew Whittaker, Idriss Blakey, James Blinco, Kevin Jack, Kirsten Lawrie, Heping Liu, Anguang Yu, Michael Leeson, Wang Yeuh, Todd Younkin

Proceedings Volume 7273, 727321 (2009) https://doi.org/10.1117/12.820493

KEYWORDS: Polymers, Photons, Stars, Extreme ultraviolet, Polymethylmethacrylate, Extreme ultraviolet lithography, Polymerization, Etching, Resistance, Magnesium

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Proceedings Article | 15 April 2008 Paper

Development of an operational high refractive index resist for 193nm immersion lithography

Paul Zimmerman, Jeffrey Byers, Emil Piscani, Bryan Rice, Christopher Ober, Emmanuel Giannelis, Robert Rodriguez, Dongyan Wang, Andrew Whittaker, Idriss Blakey, Lan Chen, Bronwin Dargaville, Heping Liu

Proceedings Volume 6923, 692306 (2008) https://doi.org/10.1117/12.772871

KEYWORDS: Nanoparticles, Refractive index, Absorbance, Immersion lithography, Polymers, Lithography, Chemistry, Chlorine, Sulfur, Line edge roughness

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SPIE Journal Paper | 1 April 2008

Application of quantitative structure property relationship to the design of high refractive index 193i resist

Heping Liu, Idriss Blakey, Willard Conley, Graeme George, David Hill, Andrew Whittaker

JM3, Vol. 7, Issue 02, 023001, (April 2008) https://doi.org/10.1117/12.10.1117/1.2908937

KEYWORDS: Chromium, Etching, Line edge roughness, Double patterning technology, Photomasks, Photoresist processing, Refractive index, Image registration, Lithography, Scanning electron microscopy

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Proceedings Article | 6 April 2007 Paper

The rational design of polymeric EUV resist materials by QSPR modelling

Kevin Jack, Heping Liu, Idriss Blakey, David Hill, Wang Yueh, Heidi Cao, Michael Leeson, Greg Denbeaux, Justin Waterman, Andrew Whittaker

Proceedings Volume 6519, 65193Z (2007) https://doi.org/10.1117/12.716213

KEYWORDS: Polymers, Extreme ultraviolet, Data modeling, Molecules, Photons, Ionization, Process modeling, Polymethylmethacrylate, Modeling, Spectroscopy

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Proceedings Article | 22 March 2007 Paper

Novel high-index resists for 193-nm immersion lithography and beyond

Idriss Blakey, Lan Chen, Bronwin Dargaville, Heping Liu, Andrew Whittaker, Will Conley, Emil Piscani, Georgia Rich, Alvina Williams, Paul Zimmerman

Proceedings Volume 6519, 651909 (2007) https://doi.org/10.1117/12.715108

KEYWORDS: Polymers, Refractive index, Polymerization, Immersion lithography, Molecules, Absorbance, Nitrogen, Data modeling, Water, Sulfur

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Proceedings Article | 29 March 2006 Paper

Synthesis of high refractive index sulfur containing polymers for 193 nm immersion lithography: a progress report

Idriss Blakey, Will Conley, Graeme George, David J. T. Hill, Heping Liu, Firas Rasoul, Andrew Whittaker

Proceedings Volume 6153, 61530H (2006) https://doi.org/10.1117/12.659757

KEYWORDS: Refractive index, Polymers, Absorbance, Molecules, Absorption, Data modeling, Sulfur, Immersion lithography, Water, Polymerization

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Proceedings Article | 4 May 2005 Paper

High-RI resist polymers for 193 nm immersion lithography

Andrew Whittaker, Idriss Blakey, Heping Liu, David Hill, Graeme George, Will Conley, Paul Zimmerman

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600630

KEYWORDS: Polymers, Refractive index, Sulfur, Data modeling, Immersion lithography, Plasma etching, Sodium, Molecules, Nitrogen, Polymerization

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Showing 5 of 19 publications

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