Photo-directed orientation control of block copolymer (BCP) domains is a powerful method for generating distinct regions of perpendicular and parallel-aligned lamella in a single film layer. In this study we demonstrate the versatility of Poly(aryl methacrylate) films for controlling the wetting behaviour of PS-b-PMMA films after UV irradiation. Upon exposure to UV light (254 nm), the surface polarity of Poly(aryl methacrylate) films changed due to the photo-Fries rearrangement of the aromatic ester groups. The switch of PS-b-PMMA alignment from parallel to perpendicular lamellar structures was demonstrated after UV exposure to appropriate doses of poly(aryl methacrylate) films. The UV dose required to switch alignment and orientation in a wide range of BCP films can be tailored by rational structural design of the poly(aryl methacrylate). This simple, rapid, cost-effective and flexible approach to controlling BCP orientation makes this photo-directing chemoepitaxy approach promising for block copolymer self-assembly applications.
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