Dr. Christophe Constancias
at MINATEC
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 20 June 2024 Presentation + Paper
Christophe Constancias, Badhise Ben Bakir, Maeva Doron, Olivier Lartigue, Sonia Messaoudène, Adrien Poizat, Sarah Renault, Jules Skubich, Marion Volpert, Olivier Masson, Clément Garaffa, Julien Marianne, Eric Gautier, Séverine Moune, Edouard Régis, Philippe Labazuy
Proceedings Volume 12999, 129990J (2024) https://doi.org/10.1117/12.3016917
KEYWORDS: Quantum cascade lasers, Photoacoustic spectroscopy, Miniaturization, Silicon, Gases, Carbon dioxide, Mid infrared, Environmental sensing, Sensors

Proceedings Article | 5 March 2022 Presentation + Paper
C. Cardoux, L. Casiez, N. Pauc, V. Calvo, N. Coudurier, P. Rodriguez, J. Richy, P. Barritault, O. Lartigue, C. Constancias, M. Frauenrath, J.M. Hartmann, A. Chelnokov, O. Gravrand, V. Reboud
Proceedings Volume 12006, 120060A (2022) https://doi.org/10.1117/12.2608964
KEYWORDS: Light emitting diodes, Sensors, Germanium, Calibration, Silicon, FT-IR spectroscopy, Spectral calibration, Tin, Photodiodes

Proceedings Article | 9 September 2019 Paper
S. Boutami, G. Jobert, P. Barritault, J. G. Coutard, M. Fournier, J. M. Fédéli, P. Labeye, A. Marchant, J. Skubich, A. Teulle, O. Lartigue, E. Lorent, A. Glière, C. Constancias, S. Nicoletti, C. Jamois, C. Seassal, L. Duraffourg
Proceedings Volume 11088, 110880R (2019) https://doi.org/10.1117/12.2529262
KEYWORDS: Sensors, Silicon, Particles, Mid-IR, Quantum cascade lasers, Photoacoustic spectroscopy, Scattering, Absorption, Light scattering, Acoustics

Proceedings Article | 19 March 2015 Paper
Proceedings Volume 9423, 94231Q (2015) https://doi.org/10.1117/12.2085832
KEYWORDS: Lithography, Electron beam lithography, Silicon, Point spread functions, Scanning electron microscopy, Critical dimension metrology, 3D modeling, Information technology, Etching, Monte Carlo methods

Proceedings Article | 21 March 2012 Paper
Jan Frederik Van Steenbergen, Noboru Ootsuka, Xavier Buch, Béatrice Icard, Claire Sourd, Christophe Constancias, Bernard Dalzotto, Laurent Pain
Proceedings Volume 8323, 83232M (2012) https://doi.org/10.1117/12.916624
KEYWORDS: Photoresist materials, Lithography, Line width roughness, Electron beam lithography, Extreme ultraviolet, Chemically amplified resists, Electron beams, Semiconducting wafers, Silicon, Chemistry

Showing 5 of 13 publications
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