Charles Pieczulewski
Strategy Executive (Director)
SPIE Involvement:
Author
Area of Expertise:
Photolithography equipment & process (exposure, track)
Websites:
Profile Summary

SCREEN SEMICONDUCTOR SOLUTIONS CO., LTD.
APRIL 2005 – Present (14 YEARS) Kyoto, JAPAN
* 2020/4 - Present: Strategy Executive (Director)
* 2018/4 - 2020/3: Deputy Sr. GM, Global Sales Ops.
* 2016/4 - 2019/3: Deputy Sr. GM, Track System Ops.
* 2016/4 - 2019/3: GM, Lithography Development Div.
* 2016/4 - 2018/3: Deputy GM, CTO Office
* 2013/4 - 2016/3: Deputy Sr. GM, Business Ops.
* 2006/7 - 2014/9: GM, Marketing Div., SOKUDO

SCREEN SPE USA, LLC
JANUARY 2000 – Present (20 YEARS) Sunnyvale, CA USA
* Vice President (since April 2016) dual assignment with SCREEN, Japan HQ role above.
* Sr. Product Engineer (2000/1 - 2005/3) Photolithography coat/develop track

CANON, INC.
APRIL 1995 – DEC. 1999 (5 YEARS) Utsunomiya, JAPAN
Support roles in manufacturing quality assurance, product marketing, lithography roadmap planning, and sales.

EDUCATION

MASSACHUSETTS INSTITUTE OF TECHNOLOGY (MIT)
Dual Masters Degrees (1995)
S.M. Materials Science & Engineering,
S.M. Technology & Policy

NORTHWESTERN UNIVERSITY
B.S. Materials Science & Engineering (1992)

Publications (20)

Proceedings Article | 4 June 2019 Paper
Masahiko Harumoto, Yuji Tanaka, Chisayo Nakayama, You Arisawa, Masaya Asai, Charles Pieczulewski, Harold Stokes, Kimiko Yamamoto, Hiroki Tanaka, Yasuaki Tanaka, Kazuyo Morita
Proceedings Volume 10957, 109571V (2019) https://doi.org/10.1117/12.2517692
KEYWORDS: System on a chip, Silicon, Etching, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line width roughness, Photoresist developing, Scanning electron microscopy, Antireflective coatings

Proceedings Article | 25 March 2019 Paper
Kazuyo Morita, Kimiko Yamamoto, Hiroki Tanaka, Yasuaki Tanaka, Masahiko Harumoto, Yuji Tanaka, Chisayo Nakayama, You Arisawa, Tomohiro Motono, Harold Stokes, Masaya Asai, Charles Pieczulewski
Proceedings Volume 10960, 109601A (2019) https://doi.org/10.1117/12.2514915
KEYWORDS: System on a chip, Reactive ion etching, Image processing, Extreme ultraviolet, Carbon, Scanning electron microscopy, Optical lithography, Etching, Semiconducting wafers, Logic devices

Proceedings Article | 13 March 2018 Presentation + Paper
Proceedings Volume 10586, 105860J (2018) https://doi.org/10.1117/12.2297471
KEYWORDS: Annealing, Line width roughness, Semiconducting wafers, Line edge roughness, Ultraviolet radiation, Etching, Optical lithography, Lithography, Photoresist materials, Reticles

Proceedings Article | 27 March 2017 Paper
Masahiko Harumoto, Harold Stokes, Yuji Tanaka, Koji Kaneyama, Chalres Pieczulewski, Masaya Asai, Maxime Argoud, Isabelle Servin, Gaëlle Chamiot-Maitral, Guillaume Claveau, Raluca Tiron, Ian Cayrefourcq
Proceedings Volume 10146, 101461X (2017) https://doi.org/10.1117/12.2257945
KEYWORDS: Directed self assembly, Optical lithography, Thin film coatings, Line width roughness, Annealing, Oxygen, Scanning electron microscopy, Atmospheric modeling, Semiconducting wafers, Polymers

Proceedings Article | 27 March 2017 Paper
Proceedings Volume 10143, 101431Z (2017) https://doi.org/10.1117/12.2259994
KEYWORDS: Annealing, Extreme ultraviolet, Line width roughness, Semiconducting wafers, Standards development, Extreme ultraviolet lithography, Lithography, Thin film coatings, Wafer testing, Metrology

Proceedings Article | 1 April 2016 Paper
Proceedings Volume 9777, 97770O (2016) https://doi.org/10.1117/12.2219925
KEYWORDS: Lithography, Semiconducting wafers, Directed self assembly, Image processing, Scanning electron microscopy, Etching, Immersion lithography, Optical lithography, Annealing, Distance measurement

Proceedings Article | 18 March 2016 Paper
Proceedings Volume 9776, 977628 (2016) https://doi.org/10.1117/12.2218947
KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Thin film coatings, Photoresist processing, Bridges, Semiconducting wafers, Wafer-level optics, Scanning electron microscopy

Proceedings Article | 20 March 2015 Paper
Proceedings Volume 9425, 94250G (2015) https://doi.org/10.1117/12.2085277
KEYWORDS: Semiconducting wafers, Coating, High speed cameras, Extreme ultraviolet, Photoresist materials, Photoresist processing, Video, Silicon, Content addressable memory, Lithium

Proceedings Article | 19 March 2015 Paper
Proceedings Volume 9422, 94222C (2015) https://doi.org/10.1117/12.2085275
KEYWORDS: Line width roughness, Photoresist processing, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist developing, Semiconducting wafers, Image processing, Bridges, Scanning electron microscopy, Wafer-level optics

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 904829 (2014) https://doi.org/10.1117/12.2046168
KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Photoresist processing, Thin film coatings, Scanning electron microscopy, Extreme ultraviolet lithography, Coating, Line width roughness, Lithography, Metrology

Proceedings Article | 2 April 2014 Paper
Ludovic Lattard, Jonathan Pradelles, Niels Vergeer, Erwin Slot, Laurent Pain, Erik de Jong, Gianpaolo Torriani, Charles Pieczulewski
Proceedings Volume 9050, 90502E (2014) https://doi.org/10.1117/12.2046233
KEYWORDS: Semiconducting wafers, Optical alignment, Lithography, Sensors, Cooling systems, Electron beam lithography, Interferometers, Manufacturing, Electron beams, Interfaces

Proceedings Article | 28 March 2014 Paper
M. Argoud, I. Servin, A. Gharbi, P. Pimenta Barros, K. Jullian, M. Sanche, G. Chamiot-Maitral, S. Barnola, R. Tiron, C. Navarro, X. Chevalier, C. Nicolet, G. Fleury, G. Hadziioannou, M. Asai, C. Pieczulewski
Proceedings Volume 9049, 904929 (2014) https://doi.org/10.1117/12.2046315
KEYWORDS: Polymethylmethacrylate, Etching, Lithography, Critical dimension metrology, Semiconductors, Electron beam lithography, Semiconducting wafers, Silicon, High volume manufacturing, Directed self assembly

Proceedings Article | 27 March 2014 Paper
Proceedings Volume 9051, 90510P (2014) https://doi.org/10.1117/12.2045876
KEYWORDS: Coating, Cameras, Extreme ultraviolet, Image processing, High speed cameras, Video, Semiconducting wafers, Thin film coatings, Scanning electron microscopy, Content addressable memory

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86792W (2013) https://doi.org/10.1117/12.2011354
KEYWORDS: Semiconducting wafers, Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Bridges, Photoresist processing, Scanning electron microscopy, Coating, Thin film coatings, Defect detection

Proceedings Article | 26 March 2013 Paper
R. Tiron, A. Gharbi, M. Argoud, X. Chevalier, J. Belledent, P. Pimmenta Barros, I. Servin, C. Navarro, G. Cunge, S. Barnola, L. Pain, M. Asai, C. Pieczulewski
Proceedings Volume 8680, 868012 (2013) https://doi.org/10.1117/12.2011477
KEYWORDS: Etching, Polymethylmethacrylate, Picosecond phenomena, Lithography, Polymers, 193nm lithography, Critical dimension metrology, Oxygen, Neodymium, Directed self assembly

Proceedings Article | 23 March 2012 Paper
Proceedings Volume 8322, 83222C (2012) https://doi.org/10.1117/12.916122
KEYWORDS: Extreme ultraviolet, Polymers, Photoresist processing, Semiconducting wafers, Photoresist materials, Coating, Thin film coatings, Lithography, Extreme ultraviolet lithography, Polymer thin films

Proceedings Article | 19 March 2012 Paper
Proceedings Volume 8325, 83250S (2012) https://doi.org/10.1117/12.916322
KEYWORDS: Semiconducting wafers, Standards development, Photoresist processing, Critical dimension metrology, Capillaries, Lithography, Finite element methods, Optical lithography, Yield improvement, Scanners

Proceedings Article | 4 April 2011 Paper
L. Pain, B. Icard, M. Martin, C. Constancias, S. Tedesco, P. Wiedeman, A. Farah, B. Kampherbeek, C. Pieczulewski, H. Kandrashov
Proceedings Volume 7970, 79700Y (2011) https://doi.org/10.1117/12.881286
KEYWORDS: Lithography, Photoresist processing, Semiconducting wafers, Maskless lithography, Manufacturing, Reliability, Silicon, Electrons, Projection systems, High volume manufacturing

Proceedings Article | 11 December 2009 Paper
Proceedings Volume 7520, 75201H (2009) https://doi.org/10.1117/12.837221
KEYWORDS: Semiconducting wafers, Double patterning technology, Thin film coatings, Optical lithography, Critical dimension metrology, Temperature metrology, Lithography, Scanners, Photoresist processing, Wafer manufacturing

Proceedings Article | 24 July 2002 Paper
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474276
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Temperature metrology, Photoresist materials, Optical lithography, Photoresist processing, Silicon, Thermal modeling, Liquids, Electronics

Showing 5 of 20 publications
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